The Analysis of High purity Silicon wafers using Glow Discharge Mass Spectrometry

A new discharge cell has been developed that can accommodate flat samples such as Silicon wafers. Data will be presented to demonstrate the characterisation of this new cell. The effect of varying the plasma conditions will be discussed in terms of maximising the silicon ion yield and reducing molec...

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Bibliographic Details
Published in:Analytical Sciences 1991, Vol.7(Supple), pp.1243-1246
Main Authors: Milton, D M P, Clark, J, Potter, D, Hutton, R C
Format: Article
Language:English
Subjects:
Detection Limits
Elemental analysis
GDMS
Glow Discharge
Silicon wafers
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Summary:A new discharge cell has been developed that can accommodate flat samples such as Silicon wafers. Data will be presented to demonstrate the characterisation of this new cell. The effect of varying the plasma conditions will be discussed in terms of maximising the silicon ion yield and reducing molecular interferences, thus improving the sensitivity of the VG 9000 GDMS. As a results detection limits of the sub-ppb level are readily attainable for most elements, with an ultimate limit of detection being a few ppt
ISSN:0910-6340
1348-2246
DOI:10.2116/analsci.7.Supple_1243