DFT Calculations of Photoabsorption Spectra in the VUV Region for Design of Photoresist Materials for 157 nm Lithography

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Bibliographic Details
Published in:Journal of photopolymer science and technology 2002, Vol.15 (4), p.559-568
Main Authors: ANDO, Shinji, FUJIGAYA, Tsuyohiko, UEDA, Mitsuru
Format: Article
Language:English
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ISSN:0914-9244
1349-6336
DOI:10.2494/photopolymer.15.559