Fabrication of sub-100nm Patterns using Near-field Mask Lithography with Ultra-thin Resist Process

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Bibliographic Details
Published in:Journal of photopolymer science and technology 2005, Vol.18 (3), p.435-441
Main Authors: Ito, Toshiki, Ogino, Masaya, Yamanaka, Tomohiro, Inao, Yasuhisa, Yamaguchi, Takako, Mizutani, Natsuhiko, Kuroda, Ryo
Format: Article
Language:English
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ISSN:0914-9244
1349-6336
DOI:10.2494/photopolymer.18.435