t-BOC based resists: A polymeric platform for .LEQ.0.25.MU.m lithographic technologies

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Bibliographic Details
Published in:Journal of photopolymer science and technology 1993, Vol.6 (4), p.457-472
Main Authors: Nalamasu, Omakaram, Novembre, Anthony E., Kometani, Janet M., Hanson, James E.
Format: Article
Language:English
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ISSN:0914-9244
1349-6336
DOI:10.2494/photopolymer.6.457