t-BOC based resists: A polymeric platform for .LEQ.0.25.MU.m lithographic technologies

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Published in:Journal of photopolymer science and technology 1993, Vol.6 (4), p.457-472
Main Authors: Nalamasu, Omakaram, Novembre, Anthony E., Kometani, Janet M., Hanson, James E.
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Language:English
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container_end_page 472
container_issue 4
container_start_page 457
container_title Journal of photopolymer science and technology
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creator Nalamasu, Omakaram
Novembre, Anthony E.
Kometani, Janet M.
Hanson, James E.
description
doi_str_mv 10.2494/photopolymer.6.457
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title t-BOC based resists: A polymeric platform for .LEQ.0.25.MU.m lithographic technologies
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