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Fabrication of High Aspect Ratio Channels in Fused Silica Using Femto-second Pulses and Chemical Etching at Different Conditions
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| Published in: | Journal of laser micro nanoengineering 2019-04 |
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| Format: | Article |
| Language: | English |
| Citations: | Items that cite this one |
| Online Access: | Get full text |
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| ISSN: | 1880-0688 1880-0688 |
| DOI: | 10.2961/jlmn.2019.01.0004 |