An efficient parallel algorithm for numerical modeling of processes in glow discharge monosilane plasmas

A numerical model of processes in glow discharge plasmas is presented. The model is intended for simulating the work of plasma deposition reactors. One type of ion is considered. The ion and electron plasma components are modeled by kinetic equations with collisions. An effective parallel algorithm...

Full description

Saved in:
Bibliographic Details
Published in:Optoelectronics, instrumentation, and data processing instrumentation, and data processing, 2008-10, Vol.44 (5), p.468-476
Main Authors: Vshivkov, V. A., Lazareva, G. G., Snytnikov, A. V.
Format: Article
Language:English
Subjects:
Lasers
Modeling in Physical and Technical Research
Optical Devices
Optics
Photonics
Physics
Physics and Astronomy
Citations: Items that this one cites
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:A numerical model of processes in glow discharge plasmas is presented. The model is intended for simulating the work of plasma deposition reactors. One type of ion is considered. The ion and electron plasma components are modeled by kinetic equations with collisions. An effective parallel algorithm for modeling the processes in monosilane plasmas is designed; its main characteristics are given. Results of numerical modeling using the model are adequate to data obtained in physical experiments.
ISSN:8756-6990
1934-7944
DOI:10.3103/S8756699008050129