EB Mastering Process for SIL Readout/Recording System

• Published in: Transactions of the Magnetics Society of Japan 2004/11/01, Vol.4(4-2), pp.225-230
• Main Authors: Furuki, Motohiro, Takeda, Minoru, Yamamoto, Masanobu, Saito, Kimihiro, Shinoda, Masataka, Fujiki, Toshihiro, Aki, Yuichi
• Format: Article
• Language: English
• Subjects: electron beam mastering; near-field optical pick-up; reactive ion etching; write strategy
• ISSN: 1346-7948; 1884-6726
• DOI: 10.3379/tmjpn2001.4.225

We improved the electron beam recorder with a differential pumping head for higher density discs andmass production. The beam diameters were improved by changing the aperture size of the objective lens, and beam stability was also improved by adding a sound proof case. As for the performance of the improved electron beam recorder, we have demonstrated the capability of 70Gb/in2 density recording by an electron beam mastering process and readout by a solid-immersion lens with a blue LD of 405nm wavelength and 2.05NA.In addition, we improved the pit width uniformity by introducing an appropriatewrite strategy that was simulated by a Monte Carlo simulation to the recording pulses. Thus we were able to fabricate from a 104Gb/in2 to 150Gb/in2 ROM disc by using the write strategy. For the solid-immersion lens recording system with the blue LD and 1.84NA we obtained the clear eye patterns of 73Gb/in2 in which the groove track pitch is 160nm by utilizing a phase change recording media and a polycarbonate substrate.