Preparation of antireflection structures with heat resistance by nanoimprinting using anodic porous alumina molds

Polysiloxane antireflective structures composed of tapered nanopillar arrays were prepared by nanoimprinting using anodic porous alumina molds with tapered pores. Because polysiloxane is a heat-resistant material, the resulting tapered nanopillar array structures were maintained even after heat trea...

Full description

Saved in:
Bibliographic Details
Published in:Japanese Journal of Applied Physics 2023-06, Vol.62 (6), p.68002
Main Authors: Yanagishita, Takashi, Ooe, Ryoga, Ishibashi, Yuki, Mitsuru, Tomonori
Format: Article
Language:English
Subjects:
Aluminum oxide
anodic porous alumina
antireflection
Arrays
Heat resistant materials
Heat treatment
Molds
moth eye structure
nanoimprinting
Polysiloxanes
Thermal resistance
Citations: Items that this one cites
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:Polysiloxane antireflective structures composed of tapered nanopillar arrays were prepared by nanoimprinting using anodic porous alumina molds with tapered pores. Because polysiloxane is a heat-resistant material, the resulting tapered nanopillar array structures were maintained even after heat treatment at 200 °C. In addition, no significant changes in antireflection properties were observed before and after heat treatment at 200 °C. These results indicate that the polysiloxane nanopillar arrays obtained in this study can be applied as heat-resistance antireflection structures.
ISSN:0021-4922
1347-4065
DOI:10.35848/1347-4065/acda70