Microfabrication of Anti-Reflective Chromium Mask by Gas Plasma

Saved in:
Bibliographic Details
Published in:Japanese Journal of Applied Physics 1976-01, Vol.15 (S1), p.25
Main Authors: Abe, Haruhiko, Nishioka, Kyusaku, Tamura, Setsuko, Nishimoto, Akira
Format: Article
Language:English
Citations: Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:
ISSN:0021-4922
1347-4065
DOI:10.7567/JJAPS.15S1.25