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Damage Analysis of Plasma-Etched n-GaN Crystal Surface by Nitrogen K Near-Edge X-ray Absorption Fine Structure Spectroscopy
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Published in: | Japanese Journal of Applied Physics 2012-01, Vol.51 (1S), p.1 |
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Main Authors: | , , , , , |
Format: | Article |
Language: | eng ; jpn |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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ISSN: | 0021-4922 1347-4065 |
DOI: | 10.7567/JJAP.51.01AB02 |