Deposition of Cluster-Free B-doped Hydrogenated Amorphous Silicon Films Using SiH 4 +B 10 H 14 Multi-Hollow Discharge Plasma Chemical Vapor Deposition

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Bibliographic Details
Published in:Japanese Journal of Applied Physics 2012-01, Vol.51 (1S), p.1
Main Authors: Koga, Kazunori, Nakahara, Kenta, Kim, Yeon-Won, Matsunaga, Takeaki, Yamashita, Daisuke, Matsuzaki, Hidefumi, Uchida, Giichiro, Kamataki, Kunihiro, Itagaki, Naho, Shiratani, Masaharu
Format: Article
Language:English
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ISSN:0021-4922
1347-4065
DOI:10.7567/JJAP.51.01AD03