Evaluation of the WO x Film Properties for Resistive Random Access Memory Application

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Bibliographic Details
Published in:Japanese Journal of Applied Physics 2012-04, Vol.51 (4S), p.4
Main Authors: Chen, Yi-Yueh, Chien, Wei-Chih, Lee, Ming-Hsiu, Chen, Yi-Chou, Chuang, Alfred T. H., Hong, Tian-Jue, Lin, Su-Jien, Wu, Tai-Bor, Lu, Chih-Yuan
Format: Article
Language:English
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ISSN:0021-4922
1347-4065
DOI:10.7567/JJAP.51.04DD15