Multiscale modeling for SiO 2 atomic layer deposition for high-aspect-ratio hole patterns

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Bibliographic Details
Published in:Japanese Journal of Applied Physics 2018-06, Vol.57 (6S2), p.6
Main Authors: Miyano, Yumiko, Narasaki, Ryota, Ichikawa, Takashi, Fukumoto, Atsushi, Aiso, Fumiki, Tamaoki, Naoki
Format: Article
Language:English
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ISSN:0021-4922
1347-4065
DOI:10.7567/JJAP.57.06JB03