Fabrication of highly spin-polarized Co2FeAl0.5Si0.5 thin-films

Ferromagnetic Heusler Co2FeAl0.5Si0.5 epitaxial thin-films have been fabricated in the L21 structure with saturation magnetizations over 1200 emu/cm3. Andreev reflection measurements show that the spin polarization is as high as 80% in samples sputtered on unheated MgO (100) substrates and annealed...

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Bibliographic Details
Published in:APL materials 2014-04, Vol.2 (4), p.046108-046108-7
Main Authors: Vahidi, M., Gifford, J. A., Zhang, S. K., Krishnamurthy, S., Yu, Z. G., Yu, L., Huang, M., Youngbull, C., Chen, T. Y., Newman, N.
Format: Article
Language:English
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Summary:Ferromagnetic Heusler Co2FeAl0.5Si0.5 epitaxial thin-films have been fabricated in the L21 structure with saturation magnetizations over 1200 emu/cm3. Andreev reflection measurements show that the spin polarization is as high as 80% in samples sputtered on unheated MgO (100) substrates and annealed at high temperatures. However, the spin polarization is considerably smaller in samples deposited on heated substrates.
ISSN:2166-532X
2166-532X
DOI:10.1063/1.4869798