Preparation of Microneedle Array Mold Based on MEMS Lithography Technology

As a transdermal drug delivery technology, microneedle array (MNA) has the characteristics of painless, minimally invasive, and precise dosage. This work discusses and compares the new MNA mold prepared by our group using MEMS technology. First, we introduced the planar pattern-to-cross-section tech...

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Bibliographic Details
Published in:Micromachines (Basel) 2020-12, Vol.12 (1), p.23
Main Authors: Wang, Jie, Wang, Huan, Lai, Liyan, Li, Yigui
Format: Article
Language:English
Subjects:
Arrays
Aspect ratio
Drug delivery systems
Drug dosages
Electroplating
Engraving
engraving process
Etching
LIGA process
Manufacturing
Methods
micro-electro-mechanical system (MEMS)
Microelectromechanical systems
microneedle array mold
Needles
Photolithography
Photolithography, Galvanogormung, Abformung (LIGA)
Photoresists
Polydimethylsiloxane
Polymers
Polymethyl methacrylate
Production methods
Sustained release
Technology transfer
Technology utilization
Transdermal medication
Ultraviolet (UV) tilting rotary lithography
X-rays
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Summary:As a transdermal drug delivery technology, microneedle array (MNA) has the characteristics of painless, minimally invasive, and precise dosage. This work discusses and compares the new MNA mold prepared by our group using MEMS technology. First, we introduced the planar pattern-to-cross-section technology (PCT) method using LIGA (Photolithography, Galvanogormung, Abformung) technology to obtain a three-dimensional structure similar to an X-ray mask pattern. On this basis, combined with polydimethylsiloxane (PDMS) transfer technology and electroplating process, metal MNA can be prepared. The second method is to use silicon wet etching combined with the SU-8 process to obtain a PDMS quadrangular pyramid MNA using PDMS transfer technology. Third method is to use the tilting rotary lithography process to obtain PDMS conical MNA on SU-8 photoresist through PDMS transfer technology. All three processes utilize parallel subtractive manufacturing methods, and the error range of reproducibility and accuracy is 2-11%. LIGA technology produces hollow MNA with an aspect ratio of up to 30, which is used for blood extraction and drug injection. The height of the MNA prepared by the engraving process is about 600 μm, which can achieve a sustained release effect together with a potential systemic delivery. The height of the MNA prepared by the ultraviolet exposure process is about 150 μm, which is used to stimulate the subcutaneous tissue.
ISSN:2072-666X
2072-666X
DOI:10.3390/mi12010023