Effect of sputtering power on optical Properties of RF sputtering deposited Ti6Al4V Thin Films

Ti6Al4V thin film was prepared on glass substrate by RFsputtering method. The effect of RF power on the optical propertiesof the thin films has been investigated using UV-visibleSpectrophotometer. It's found that the absorbance and the extinctioncoefficient (k) for deposited thin films increase...

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Bibliographic Details
Published in:Iraqi journal of physics 2019-01, Vol.15 (33), p.71-77
Main Author: Khalaf, Mohammed K.
Format: Article
Language:English
Subjects:
Thin Films, RF Sputtering, Optical Properties, Ti6Al4V
Online Access:Get full text
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Summary:Ti6Al4V thin film was prepared on glass substrate by RFsputtering method. The effect of RF power on the optical propertiesof the thin films has been investigated using UV-visibleSpectrophotometer. It's found that the absorbance and the extinctioncoefficient (k) for deposited thin films increase with increasingapplied power, while another parameters such as dielectric constantand refractive index decrease with increasing RF power.
ISSN:2070-4003
2664-5548
DOI:10.30723/ijp.v15i33.142