Reactively-sputtered super-hydrophilic ultra-thin titania films deposited at 120 °C

We investigate super-hydrophilic TiO 2 (titania) films for concentrated solar-thermal power applications. Reactive magnetron sputtering has been used to deposit 8 to 12 nm thick titania thin films onto borosilicate microscope glass slides, low-Fe extra-clear architectural glass, or Si(100) wafers wi...

Full description

Saved in:
Bibliographic Details
Published in:Materials research express 2023-11, Vol.10 (11), p.115501
Main Authors: Kaidatzis, Andreas, Mouti, Nafsika, Arfanis, Michalis, Papadimitropoulos, Giorgos, Mitterer, Christian, Falaras, Polycarpos, Giannakopoulos, Konstantinos
Format: Article
Language:English
Subjects:
Borosilicate glass
Contact angle
CSP
Deposition
Hydrophilicity
Magnetron sputtering
reactive sputtering
Silicon dioxide
super-hydrophilic
Thick films
Thin films
titania
Titanium dioxide
Citations: Items that this one cites
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:We investigate super-hydrophilic TiO 2 (titania) films for concentrated solar-thermal power applications. Reactive magnetron sputtering has been used to deposit 8 to 12 nm thick titania thin films onto borosilicate microscope glass slides, low-Fe extra-clear architectural glass, or Si(100) wafers with a 500 nm thick thermal SiO 2 layer. The effects of deposition temperature and O 2 fraction of the O 2 /Ar working gas were investigated. We demonstrate the importance of the O 2 fraction for obtaining optically transparent, super-hydrophilic (contact angle below 1°) thin films. In particular, we show that as the O 2 fraction increases, contact angle decreases, obtaining super-hydrophilic titania thin films at deposition temperatures as low as 120 °C. Our work enables to develop low thermal budget cost-efficient industrial synthesis processes, paving the way for commercial applications.
ISSN:2053-1591
2053-1591
DOI:10.1088/2053-1591/ad0450