Correction to: Wafer-Scale Fabrication of Sub-10 nm TiO2-Ga2O3 n-p Heterojunctions with Efficient Photocatalytic Activity by Atomic Layer Deposition

Please be advised that the name of one of the coauthors in the original article [1] has been incorrectly spelled: ‘Ranish M. Ramachandran’ should be ‘Ranjith K. Ramachandran’ .

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Bibliographic Details
Published in:Nanoscale research letters 2019-05, Vol.14 (1), p.173-1, Article 173
Main Authors: Xu, Hongyan, Han, Feng, Xia, Chengkai, Wang, Siyan, Ramachandran, Ranjith K., Detavernier, Christophe, Wei, Minsong, Lin, Liwei, Zhuiykov, Serge
Format: Article
Language:English
Subjects:
Atomic layer epitaxy
Atomic properties
Catalytic activity
Chemistry and Materials Science
Correction
Fabrication
Gallium oxides
Heterojunctions
Materials Science
Molecular Medicine
Nanochemistry
Nanoscale Science and Technology
Nanotechnology
Nanotechnology and Microengineering
Photocatalysis
Titanium dioxide
Citations: Items that this one cites
Online Access:Get full text
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Description
Summary:Please be advised that the name of one of the coauthors in the original article [1] has been incorrectly spelled: ‘Ranish M. Ramachandran’ should be ‘Ranjith K. Ramachandran’ .
ISSN:1931-7573
1556-276X
DOI:10.1186/s11671-019-3028-5