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A study of real-world micrograph data quality and machine learning model robustness

Machine-learning (ML) techniques hold the potential of enabling efficient quantitative micrograph analysis, but the robustness of ML models with respect to real-world micrograph quality variations has not been carefully evaluated. We collected thousands of scanning electron microscopy (SEM) microgra...

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Bibliographic Details
Published in:npj computational materials 2021-10, Vol.7 (1), p.1-11, Article 161
Main Authors: Zhong, Xiaoting, Gallagher, Brian, Eves, Keenan, Robertson, Emily, Mundhenk, T. Nathan, Han, T. Yong-Jin
Format: Article
Language:English
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Summary:Machine-learning (ML) techniques hold the potential of enabling efficient quantitative micrograph analysis, but the robustness of ML models with respect to real-world micrograph quality variations has not been carefully evaluated. We collected thousands of scanning electron microscopy (SEM) micrographs for molecular solid materials, in which image pixel intensities vary due to both the microstructure content and microscope instrument conditions. We then built ML models to predict the ultimate compressive strength (UCS) of consolidated molecular solids, by encoding micrographs with different image feature descriptors and training a random forest regressor, and by training an end-to-end deep-learning (DL) model. Results show that instrument-induced pixel intensity signals can affect ML model predictions in a consistently negative way. As a remedy, we explored intensity normalization techniques. It is seen that intensity normalization helps to improve micrograph data quality and ML model robustness, but microscope-induced intensity variations can be difficult to eliminate.
ISSN:2057-3960
2057-3960
DOI:10.1038/s41524-021-00616-3