Electrodeposition of Nanoparticles and Continuous Film of CdSe on n-Si (100)

CdSe electrodeposition on n-Si (100) substrate was investigated in sulfuric acid solution. The behaviour and the deposition of the precursors (Cd and Se) were studied separately at first. Then, we explored both the alternated deposition, one layer by one, as well as the simultaneous co-deposition of...

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Bibliographic Details
Published in:Nanomaterials (Basel, Switzerland) Switzerland), 2019-10, Vol.9 (10), p.1504
Main Authors: Giurlani, Walter, Dell’Aquila, Vincenzo, Vizza, Martina, Calisi, Nicola, Lavacchi, Alessandro, Irrera, Alessia, Lo Faro, Maria Josè, Leonardi, Antonio Alessio, Morganti, Dario, Innocenti, Massimo
Format: Article
Language:English
Subjects:
cadmium
Cadmium selenide
Cadmium selenides
cdse
Electrodeposition
Electrodes
emitting diode
Light
Nanoparticles
Nitrogen
Optoelectronics
Photoelectric emission
Radiation
selenide
Semiconductors
Sensors
Silicon
Silicon substrates
Spectrum analysis
Sulfuric acid
thin film
Thin films
X ray photoelectron spectroscopy
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Summary:CdSe electrodeposition on n-Si (100) substrate was investigated in sulfuric acid solution. The behaviour and the deposition of the precursors (Cd and Se) were studied separately at first. Then, we explored both the alternated deposition, one layer by one, as well as the simultaneous co-deposition of the two elements to form the CdSe semiconductor. Varying the deposition conditions, we were able to obtain nanoparticles, or a thin film, on the surface of the electrode. The samples were then characterised microscopically and spectroscopically with SEM, XRD and XPS. Finally, we evaluated the induced photoemission of the deposit for the application in optoelectronics.
ISSN:2079-4991
2079-4991
DOI:10.3390/nano9101504