Automated alignment in mask‐free photolithography enabled by micro‐LED arrays

We present an automated control system for micro scale positioning, based on single pixel imaging and fluorescence. By projecting a chequerboard array of CMOS controllable μ‐LEDs at a suitable wavelength, we are able to spatially locate, track and automatically align to fluorescent markers. Position...

Full description

Saved in:
Bibliographic Details
Published in:Electronics letters 2021-09, Vol.57 (19), p.721-723
Main Authors: Stonehouse, M., Blanchard, A., Guilhabert, B., Zhang, Y., Gu, E., Watson, I. M., Herrnsdorf, J., Dawson, M. D.
Format: Article
Language:English
Subjects:
Alignment
Arrays
Automatic control
Automation
Cameras
CMOS integrated circuits
Computer vision and image processing techniques
Control systems
Controllability
Field programmable gate arrays
Fluorescent indicators
Light emitting diodes
Lithography (semiconductor technology)
Optical, image and video signal processing
Photolithography
Photoresists
Quantum dots
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:We present an automated control system for micro scale positioning, based on single pixel imaging and fluorescence. By projecting a chequerboard array of CMOS controllable μ‐LEDs at a suitable wavelength, we are able to spatially locate, track and automatically align to fluorescent markers. Positioning is demonstrated with accuracy on the order of 20 μm. We present a maskless photo‐lithography system using the automated control capability and a second μ‐LED array to photo‐cure customisable structures in photoresist with alignment referenced to the fluorescent markers.
ISSN:0013-5194
1350-911X
DOI:10.1049/ell2.12244