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An Analytical Model for the Gate C-V Characteristics of UTB III-V-on-Insulator MIS Structure
We propose a physics-based analytical model for gate capacitance-voltage characteristics of ultra-thin-body III - V-on-insulator (XOI) MIS structure. The accuracy of the analytical model is verified by comparing with TCAD results. The model is general and is applicable to different III-V channel mat...
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Published in: | IEEE journal of the Electron Devices Society 2017-09, Vol.5 (5), p.335-339 |
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Main Authors: | , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites |
Online Access: | Get full text |
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Summary: | We propose a physics-based analytical model for gate capacitance-voltage characteristics of ultra-thin-body III - V-on-insulator (XOI) MIS structure. The accuracy of the analytical model is verified by comparing with TCAD results. The model is general and is applicable to different III-V channel materials. |
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ISSN: | 2168-6734 2168-6734 |
DOI: | 10.1109/JEDS.2017.2725340 |