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Thermoelectric power for thermally deposited cadmium telluride films

Thermal evaporation method has used for depositing CdTe filmson corning glass slides under vacuum of about 10-5mbar. Thethicknesses of the prepared films are400 and 1000 nm. The preparedfilms annealed at 573 K. The structural of CdTe powder and preparedfilms investigated. The hopping and thermal ene...

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Bibliographic Details
Published in:Iraqi journal of physics 2019-02, Vol.13 (26), p.38-41
Main Author: A. Alias, M. F.
Format: Article
Language:English
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Summary:Thermal evaporation method has used for depositing CdTe filmson corning glass slides under vacuum of about 10-5mbar. Thethicknesses of the prepared films are400 and 1000 nm. The preparedfilms annealed at 573 K. The structural of CdTe powder and preparedfilms investigated. The hopping and thermal energies of as depositedand annealed CdTe films studied as a function of thickness. Apolycrystalline structure observed for CdTe powder and preparedfilms. All prepared films are p-type semiconductor. The hoppingenergy decreased as thickness increased, while thermal energyincreased.
ISSN:2070-4003
2664-5548
DOI:10.30723/ijp.v13i26.281