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The combined effect of coating treatments to nisin, nano-silica, and chitosan on oxidation processes of stored button mushrooms at 4 °C
Agaricus bisporus is an edible fungus with a limited shelf life due to high moisture loss, browning, respiration, self-dissolve, lack of physical protection, rotting, and microbial attack. Mushrooms have been coated with nisin, nano-silica, and chitosan films in order to extend the shelf life, prese...
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Published in: | Scientific reports 2021-03, Vol.11 (1), p.6031-6031, Article 6031 |
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Main Authors: | , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | Agaricus bisporus
is an edible fungus with a limited shelf life due to high moisture loss, browning, respiration, self-dissolve, lack of physical protection, rotting, and microbial attack. Mushrooms have been coated with nisin, nano-silica, and chitosan films in order to extend the shelf life, preserve quality and oxidation activities. The results showed that treating the mushrooms with chitosan and nano-silica (CH-AN-SILICA) increased superoxide dismutase activity (SOD—6.53 U kg
−1
), total phenolic content (TPC—0.39 g kg
−1
), and malondialdehyde content (MDA—1.63 µmol kg
−1
). CH-AN-SILICA treatment exhibited the highest scavenging against 2,2-Diphenyl-1-picrylhydrazyl (DPPH) and 2,2′-azino-bis(3-ethylbenzothiazoline-6-sulfonic acid) (ABTS) radicals. While, CH-AN-SILICA with the addition of nisin as an antimicrobial agent preserved almost the reactive oxygen species such as hydroxyl radicals (OH—0.33 µmol g
−1
), superoxide anion (O
2
•−
—0.271 mmol s
−1
kg
−1
), and hydrogen peroxide (H
2
O
2
—21.54 µmol g
−1
). Besides, both CH-AN-SILICA and CH-AN-SILICA/N enhanced the catalase (CAT) activity and reduced the respiration rate. The results indicated that the combination of nisin, nano-silica, and chitosan coating films was effective in providing a longer storage life with acceptable quality in mushrooms. |
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ISSN: | 2045-2322 2045-2322 |
DOI: | 10.1038/s41598-021-85610-x |