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Extended Phase Unwrapping Max-Flow/Min-Cut Algorithm for Multibaseline SAR Interferograms Using a Two-Stage Programming Approach
Multi-baseline (MB) phase unwrapping (PU) is a key step of MB synthetic aperture radar (SAR) interferometry (InSAR). Compared with the traditional single-baseline (SB) PU, MB PU is applicable to the area where topography varies violently without obeying the phase continuity assumption. A two-stage p...
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Published in: | Sensors (Basel, Switzerland) Switzerland), 2020-01, Vol.20 (2), p.375 |
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Main Authors: | , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | Multi-baseline (MB) phase unwrapping (PU) is a key step of MB synthetic aperture radar (SAR) interferometry (InSAR). Compared with the traditional single-baseline (SB) PU, MB PU is applicable to the area where topography varies violently without obeying the phase continuity assumption. A two-stage programming MB PU approach (TSPA) proposed by H. Yu. builds the link between SB and MB PUs, so many existing classical SB PU methods can be transplanted into the MB domain. In this paper, an extended PU max-flow/min-cut (PUMA) algorithm for MB InSAR using the TSPA, referred to as TSPA-PUMA, is proposed, consisting of a two-stage programming procedure. In stage 1, phase gradients are estimated based on Chinese remainder theorem (CRT). In stage 2, a Markov random field (MRF) model of PUMA is designed for modeling local contextual dependence based on the phase gradients obtained by stage 1. Subsequently, the energy of the MRF model is minimized by graph cuts techniques. The experiment results illustrate that the TSPA-PUMA method can drastically enhance the accuracy of the original PUMA method in the rugged area, and is more efficient than the original TSPA method. In addition, the noise robustness of TSPA-PUMA can be improved through adding more interferograms with different baseline lengths. |
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ISSN: | 1424-8220 1424-8220 |
DOI: | 10.3390/s20020375 |