Loading…
Effect of oxide film on nanoscale mechanical removal of pure iron
In this paper, the properties of an oxide film formed on a pure iron surface after being polished with an H 2 O 2 -based acidic slurry were investigated using an atomic force microscope (AFM), Auger electron spectroscopy (AES), and angle-resolved X-ray photoelectron spectroscopy (AR-XPS) to partly r...
Saved in:
Published in: | Friction 2018-09, Vol.6 (3), p.307-315 |
---|---|
Main Authors: | , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
cited_by | cdi_FETCH-LOGICAL-c425t-a19790e9c8be052db0bf703c262f855e3cb49d39df204b20f78935cf7234e0cb3 |
---|---|
cites | cdi_FETCH-LOGICAL-c425t-a19790e9c8be052db0bf703c262f855e3cb49d39df204b20f78935cf7234e0cb3 |
container_end_page | 315 |
container_issue | 3 |
container_start_page | 307 |
container_title | Friction |
container_volume | 6 |
creator | Liu, Jinwei Jiang, Liang Deng, Changbang Du, Wenhao Qian, Linmao |
description | In this paper, the properties of an oxide film formed on a pure iron surface after being polished with an H
2
O
2
-based acidic slurry were investigated using an atomic force microscope (AFM), Auger electron spectroscopy (AES), and angle-resolved X-ray photoelectron spectroscopy (AR-XPS) to partly reveal the material removal mechanism of pure iron during chemical mechanical polishing (CMP). The AFM results show that, when rubbed against a cone-shaped diamond tip in vacuum, the material removal depth of the polished pure iron first slowly increases to 0.45 nm with a relatively small slope of 0.11 nm/μN as the applied load increases from 0 to 4 μN, and then rapidly increases with a large slope of 1.98 nm/μN when the applied load further increases to 10 μN. In combination with the AES and AR-XPS results, a layered oxide film with approximately 2 nm thickness (roughly estimated from the sputtering rate) is formed on the pure iron surface. Moreover, the film can be simply divided into two layers, namely, an outer layer and an inner layer. The outer layer primarily consists of FeOOH (most likely α-FeOOH) and possibly Fe
2
O
3
with a film thickness ranging from 0.36 to 0.48 nm (close to the 0.45 nm material removal depth at the 4 μN turning point), while the inner layer primarily consists of Fe
3
O
4
. The mechanical strength of the outer layer is much higher than that of the inner layer. Moreover, the mechanical strength of the inner layer is quite close to that of the pure iron substrate. However, when a real CMP process is applied to pure iron, pure mechanical wear by silica particles generates almost no material removal due to the extremely high mechanical strength of the oxide film. This indicates that other mechanisms, such as
in-situ
chemical corrosion-enhanced mechanical wear, dominate the CMP process. |
doi_str_mv | 10.1007/s40544-018-0238-2 |
format | article |
fullrecord | <record><control><sourceid>proquest_doaj_</sourceid><recordid>TN_cdi_doaj_primary_oai_doaj_org_article_602703c3ed0043d2a5b06af2c9e7bb92</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><doaj_id>oai_doaj_org_article_602703c3ed0043d2a5b06af2c9e7bb92</doaj_id><sourcerecordid>2100181571</sourcerecordid><originalsourceid>FETCH-LOGICAL-c425t-a19790e9c8be052db0bf703c262f855e3cb49d39df204b20f78935cf7234e0cb3</originalsourceid><addsrcrecordid>eNp1kM1LAzEQxRdRsNT-Ad4WPK9OJkmzOYrUDyh40XNIshNdaTc1aUX_e1PXj5OneQzv_WZ4VXXK4JwBqIssQArRAGsbQN42eFBNEJE3SoE4_NFzDcfVLOfeARccJVMwqS4XIZDf1jHU8b3vqA79al3HoR7sELO3K6rX5J_t0BddJ1rHtzKLe7NLVPcpDifVUbCrTLPvOa0erxcPV7fN8v7m7upy2XiBcttYppUG0r51BBI7By4o4B7nGFopiXsndMd1FxCEQwiq1Vz6oJALAu_4tLobuV20L2aT-rVNHyba3nwtYnoyNm17vyIzB9yjOXUAgndopYO5Deg1Kec0FtbZyNqk-LqjvDUvcZeG8r7B0ihrmVSsuNjo8inmnCj8XmVg9sWbsXhTAmZfvNmTcczk4h2eKP2R_w99Amjag5Y</addsrcrecordid><sourcetype>Open Website</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>2100181571</pqid></control><display><type>article</type><title>Effect of oxide film on nanoscale mechanical removal of pure iron</title><source>Publicly Available Content Database</source><source>Springer Nature - SpringerLink Journals - Fully Open Access</source><creator>Liu, Jinwei ; Jiang, Liang ; Deng, Changbang ; Du, Wenhao ; Qian, Linmao</creator><creatorcontrib>Liu, Jinwei ; Jiang, Liang ; Deng, Changbang ; Du, Wenhao ; Qian, Linmao</creatorcontrib><description>In this paper, the properties of an oxide film formed on a pure iron surface after being polished with an H
2
O
2
-based acidic slurry were investigated using an atomic force microscope (AFM), Auger electron spectroscopy (AES), and angle-resolved X-ray photoelectron spectroscopy (AR-XPS) to partly reveal the material removal mechanism of pure iron during chemical mechanical polishing (CMP). The AFM results show that, when rubbed against a cone-shaped diamond tip in vacuum, the material removal depth of the polished pure iron first slowly increases to 0.45 nm with a relatively small slope of 0.11 nm/μN as the applied load increases from 0 to 4 μN, and then rapidly increases with a large slope of 1.98 nm/μN when the applied load further increases to 10 μN. In combination with the AES and AR-XPS results, a layered oxide film with approximately 2 nm thickness (roughly estimated from the sputtering rate) is formed on the pure iron surface. Moreover, the film can be simply divided into two layers, namely, an outer layer and an inner layer. The outer layer primarily consists of FeOOH (most likely α-FeOOH) and possibly Fe
2
O
3
with a film thickness ranging from 0.36 to 0.48 nm (close to the 0.45 nm material removal depth at the 4 μN turning point), while the inner layer primarily consists of Fe
3
O
4
. The mechanical strength of the outer layer is much higher than that of the inner layer. Moreover, the mechanical strength of the inner layer is quite close to that of the pure iron substrate. However, when a real CMP process is applied to pure iron, pure mechanical wear by silica particles generates almost no material removal due to the extremely high mechanical strength of the oxide film. This indicates that other mechanisms, such as
in-situ
chemical corrosion-enhanced mechanical wear, dominate the CMP process.</description><identifier>ISSN: 2223-7690</identifier><identifier>EISSN: 2223-7704</identifier><identifier>DOI: 10.1007/s40544-018-0238-2</identifier><language>eng</language><publisher>Beijing: Tsinghua University Press</publisher><subject>Atomic force microscopes ; Atomic force microscopy ; Chemical-mechanical polishing ; Corrosion and Coatings ; Corrosive wear ; Diamonds ; Engineering ; Film thickness ; Hematite ; Hydrogen peroxide ; Iron oxides ; Mechanical Engineering ; nanoscale mechanical removal ; Nanotechnology ; Organic chemistry ; Oxide coatings ; oxide film ; Physical Chemistry ; pure iron ; Research Article ; Silicon dioxide ; Slurries ; Spectrum analysis ; Substrates ; Surfaces and Interfaces ; Tensile strength ; Thin Films ; Tribology ; Wear mechanisms ; X ray photoelectron spectroscopy</subject><ispartof>Friction, 2018-09, Vol.6 (3), p.307-315</ispartof><rights>The author(s) 2018</rights><rights>Friction is a copyright of Springer, (2018). All Rights Reserved.</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c425t-a19790e9c8be052db0bf703c262f855e3cb49d39df204b20f78935cf7234e0cb3</citedby><cites>FETCH-LOGICAL-c425t-a19790e9c8be052db0bf703c262f855e3cb49d39df204b20f78935cf7234e0cb3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://www.proquest.com/docview/2100181571/fulltextPDF?pq-origsite=primo$$EPDF$$P50$$Gproquest$$Hfree_for_read</linktopdf><linktohtml>$$Uhttps://www.proquest.com/docview/2100181571?pq-origsite=primo$$EHTML$$P50$$Gproquest$$Hfree_for_read</linktohtml><link.rule.ids>314,780,784,25753,27924,27925,37012,44590,75126</link.rule.ids></links><search><creatorcontrib>Liu, Jinwei</creatorcontrib><creatorcontrib>Jiang, Liang</creatorcontrib><creatorcontrib>Deng, Changbang</creatorcontrib><creatorcontrib>Du, Wenhao</creatorcontrib><creatorcontrib>Qian, Linmao</creatorcontrib><title>Effect of oxide film on nanoscale mechanical removal of pure iron</title><title>Friction</title><addtitle>Friction</addtitle><description>In this paper, the properties of an oxide film formed on a pure iron surface after being polished with an H
2
O
2
-based acidic slurry were investigated using an atomic force microscope (AFM), Auger electron spectroscopy (AES), and angle-resolved X-ray photoelectron spectroscopy (AR-XPS) to partly reveal the material removal mechanism of pure iron during chemical mechanical polishing (CMP). The AFM results show that, when rubbed against a cone-shaped diamond tip in vacuum, the material removal depth of the polished pure iron first slowly increases to 0.45 nm with a relatively small slope of 0.11 nm/μN as the applied load increases from 0 to 4 μN, and then rapidly increases with a large slope of 1.98 nm/μN when the applied load further increases to 10 μN. In combination with the AES and AR-XPS results, a layered oxide film with approximately 2 nm thickness (roughly estimated from the sputtering rate) is formed on the pure iron surface. Moreover, the film can be simply divided into two layers, namely, an outer layer and an inner layer. The outer layer primarily consists of FeOOH (most likely α-FeOOH) and possibly Fe
2
O
3
with a film thickness ranging from 0.36 to 0.48 nm (close to the 0.45 nm material removal depth at the 4 μN turning point), while the inner layer primarily consists of Fe
3
O
4
. The mechanical strength of the outer layer is much higher than that of the inner layer. Moreover, the mechanical strength of the inner layer is quite close to that of the pure iron substrate. However, when a real CMP process is applied to pure iron, pure mechanical wear by silica particles generates almost no material removal due to the extremely high mechanical strength of the oxide film. This indicates that other mechanisms, such as
in-situ
chemical corrosion-enhanced mechanical wear, dominate the CMP process.</description><subject>Atomic force microscopes</subject><subject>Atomic force microscopy</subject><subject>Chemical-mechanical polishing</subject><subject>Corrosion and Coatings</subject><subject>Corrosive wear</subject><subject>Diamonds</subject><subject>Engineering</subject><subject>Film thickness</subject><subject>Hematite</subject><subject>Hydrogen peroxide</subject><subject>Iron oxides</subject><subject>Mechanical Engineering</subject><subject>nanoscale mechanical removal</subject><subject>Nanotechnology</subject><subject>Organic chemistry</subject><subject>Oxide coatings</subject><subject>oxide film</subject><subject>Physical Chemistry</subject><subject>pure iron</subject><subject>Research Article</subject><subject>Silicon dioxide</subject><subject>Slurries</subject><subject>Spectrum analysis</subject><subject>Substrates</subject><subject>Surfaces and Interfaces</subject><subject>Tensile strength</subject><subject>Thin Films</subject><subject>Tribology</subject><subject>Wear mechanisms</subject><subject>X ray photoelectron spectroscopy</subject><issn>2223-7690</issn><issn>2223-7704</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2018</creationdate><recordtype>article</recordtype><sourceid>PIMPY</sourceid><sourceid>DOA</sourceid><recordid>eNp1kM1LAzEQxRdRsNT-Ad4WPK9OJkmzOYrUDyh40XNIshNdaTc1aUX_e1PXj5OneQzv_WZ4VXXK4JwBqIssQArRAGsbQN42eFBNEJE3SoE4_NFzDcfVLOfeARccJVMwqS4XIZDf1jHU8b3vqA79al3HoR7sELO3K6rX5J_t0BddJ1rHtzKLe7NLVPcpDifVUbCrTLPvOa0erxcPV7fN8v7m7upy2XiBcttYppUG0r51BBI7By4o4B7nGFopiXsndMd1FxCEQwiq1Vz6oJALAu_4tLobuV20L2aT-rVNHyba3nwtYnoyNm17vyIzB9yjOXUAgndopYO5Deg1Kec0FtbZyNqk-LqjvDUvcZeG8r7B0ihrmVSsuNjo8inmnCj8XmVg9sWbsXhTAmZfvNmTcczk4h2eKP2R_w99Amjag5Y</recordid><startdate>20180901</startdate><enddate>20180901</enddate><creator>Liu, Jinwei</creator><creator>Jiang, Liang</creator><creator>Deng, Changbang</creator><creator>Du, Wenhao</creator><creator>Qian, Linmao</creator><general>Tsinghua University Press</general><general>Springer Nature B.V</general><general>SpringerOpen</general><scope>C6C</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>3V.</scope><scope>7RQ</scope><scope>7XB</scope><scope>8FE</scope><scope>8FG</scope><scope>8FK</scope><scope>8G5</scope><scope>ABJCF</scope><scope>ABUWG</scope><scope>AFKRA</scope><scope>AZQEC</scope><scope>BENPR</scope><scope>BGLVJ</scope><scope>CCPQU</scope><scope>D1I</scope><scope>DWQXO</scope><scope>GNUQQ</scope><scope>GUQSH</scope><scope>HCIFZ</scope><scope>KB.</scope><scope>L6V</scope><scope>M2O</scope><scope>M7S</scope><scope>MBDVC</scope><scope>PADUT</scope><scope>PDBOC</scope><scope>PIMPY</scope><scope>PQEST</scope><scope>PQQKQ</scope><scope>PQUKI</scope><scope>PRINS</scope><scope>PTHSS</scope><scope>Q9U</scope><scope>U9A</scope><scope>DOA</scope></search><sort><creationdate>20180901</creationdate><title>Effect of oxide film on nanoscale mechanical removal of pure iron</title><author>Liu, Jinwei ; Jiang, Liang ; Deng, Changbang ; Du, Wenhao ; Qian, Linmao</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c425t-a19790e9c8be052db0bf703c262f855e3cb49d39df204b20f78935cf7234e0cb3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2018</creationdate><topic>Atomic force microscopes</topic><topic>Atomic force microscopy</topic><topic>Chemical-mechanical polishing</topic><topic>Corrosion and Coatings</topic><topic>Corrosive wear</topic><topic>Diamonds</topic><topic>Engineering</topic><topic>Film thickness</topic><topic>Hematite</topic><topic>Hydrogen peroxide</topic><topic>Iron oxides</topic><topic>Mechanical Engineering</topic><topic>nanoscale mechanical removal</topic><topic>Nanotechnology</topic><topic>Organic chemistry</topic><topic>Oxide coatings</topic><topic>oxide film</topic><topic>Physical Chemistry</topic><topic>pure iron</topic><topic>Research Article</topic><topic>Silicon dioxide</topic><topic>Slurries</topic><topic>Spectrum analysis</topic><topic>Substrates</topic><topic>Surfaces and Interfaces</topic><topic>Tensile strength</topic><topic>Thin Films</topic><topic>Tribology</topic><topic>Wear mechanisms</topic><topic>X ray photoelectron spectroscopy</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Liu, Jinwei</creatorcontrib><creatorcontrib>Jiang, Liang</creatorcontrib><creatorcontrib>Deng, Changbang</creatorcontrib><creatorcontrib>Du, Wenhao</creatorcontrib><creatorcontrib>Qian, Linmao</creatorcontrib><collection>Springer Nature OA Free Journals</collection><collection>CrossRef</collection><collection>ProQuest Central (Corporate)</collection><collection>ProQuest Career and Technical Education</collection><collection>ProQuest Central (purchase pre-March 2016)</collection><collection>ProQuest SciTech Collection</collection><collection>ProQuest Technology Collection</collection><collection>ProQuest Central (Alumni) (purchase pre-March 2016)</collection><collection>Research Library (Alumni Edition)</collection><collection>Materials Science & Engineering Collection</collection><collection>ProQuest Central (Alumni)</collection><collection>ProQuest Central</collection><collection>ProQuest Central Essentials</collection><collection>AUTh Library subscriptions: ProQuest Central</collection><collection>Technology Collection</collection><collection>ProQuest One Community College</collection><collection>ProQuest Materials Science Collection</collection><collection>ProQuest Central Korea</collection><collection>ProQuest Central Student</collection><collection>Research Library Prep</collection><collection>SciTech Premium Collection</collection><collection>Materials Science Database</collection><collection>ProQuest Engineering Collection</collection><collection>ProQuest research library</collection><collection>Engineering Database</collection><collection>Research Library (Corporate)</collection><collection>Research Library China</collection><collection>Materials Science Collection</collection><collection>Publicly Available Content Database</collection><collection>ProQuest One Academic Eastern Edition (DO NOT USE)</collection><collection>ProQuest One Academic</collection><collection>ProQuest One Academic UKI Edition</collection><collection>ProQuest Central China</collection><collection>Engineering collection</collection><collection>ProQuest Central Basic</collection><collection>Directory of Open Access Journals</collection><jtitle>Friction</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Liu, Jinwei</au><au>Jiang, Liang</au><au>Deng, Changbang</au><au>Du, Wenhao</au><au>Qian, Linmao</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Effect of oxide film on nanoscale mechanical removal of pure iron</atitle><jtitle>Friction</jtitle><stitle>Friction</stitle><date>2018-09-01</date><risdate>2018</risdate><volume>6</volume><issue>3</issue><spage>307</spage><epage>315</epage><pages>307-315</pages><issn>2223-7690</issn><eissn>2223-7704</eissn><abstract>In this paper, the properties of an oxide film formed on a pure iron surface after being polished with an H
2
O
2
-based acidic slurry were investigated using an atomic force microscope (AFM), Auger electron spectroscopy (AES), and angle-resolved X-ray photoelectron spectroscopy (AR-XPS) to partly reveal the material removal mechanism of pure iron during chemical mechanical polishing (CMP). The AFM results show that, when rubbed against a cone-shaped diamond tip in vacuum, the material removal depth of the polished pure iron first slowly increases to 0.45 nm with a relatively small slope of 0.11 nm/μN as the applied load increases from 0 to 4 μN, and then rapidly increases with a large slope of 1.98 nm/μN when the applied load further increases to 10 μN. In combination with the AES and AR-XPS results, a layered oxide film with approximately 2 nm thickness (roughly estimated from the sputtering rate) is formed on the pure iron surface. Moreover, the film can be simply divided into two layers, namely, an outer layer and an inner layer. The outer layer primarily consists of FeOOH (most likely α-FeOOH) and possibly Fe
2
O
3
with a film thickness ranging from 0.36 to 0.48 nm (close to the 0.45 nm material removal depth at the 4 μN turning point), while the inner layer primarily consists of Fe
3
O
4
. The mechanical strength of the outer layer is much higher than that of the inner layer. Moreover, the mechanical strength of the inner layer is quite close to that of the pure iron substrate. However, when a real CMP process is applied to pure iron, pure mechanical wear by silica particles generates almost no material removal due to the extremely high mechanical strength of the oxide film. This indicates that other mechanisms, such as
in-situ
chemical corrosion-enhanced mechanical wear, dominate the CMP process.</abstract><cop>Beijing</cop><pub>Tsinghua University Press</pub><doi>10.1007/s40544-018-0238-2</doi><tpages>9</tpages><oa>free_for_read</oa></addata></record> |
fulltext | fulltext |
identifier | ISSN: 2223-7690 |
ispartof | Friction, 2018-09, Vol.6 (3), p.307-315 |
issn | 2223-7690 2223-7704 |
language | eng |
recordid | cdi_doaj_primary_oai_doaj_org_article_602703c3ed0043d2a5b06af2c9e7bb92 |
source | Publicly Available Content Database; Springer Nature - SpringerLink Journals - Fully Open Access |
subjects | Atomic force microscopes Atomic force microscopy Chemical-mechanical polishing Corrosion and Coatings Corrosive wear Diamonds Engineering Film thickness Hematite Hydrogen peroxide Iron oxides Mechanical Engineering nanoscale mechanical removal Nanotechnology Organic chemistry Oxide coatings oxide film Physical Chemistry pure iron Research Article Silicon dioxide Slurries Spectrum analysis Substrates Surfaces and Interfaces Tensile strength Thin Films Tribology Wear mechanisms X ray photoelectron spectroscopy |
title | Effect of oxide film on nanoscale mechanical removal of pure iron |
url | http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-25T20%3A59%3A39IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_doaj_&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Effect%20of%20oxide%20film%20on%20nanoscale%20mechanical%20removal%20of%20pure%20iron&rft.jtitle=Friction&rft.au=Liu,%20Jinwei&rft.date=2018-09-01&rft.volume=6&rft.issue=3&rft.spage=307&rft.epage=315&rft.pages=307-315&rft.issn=2223-7690&rft.eissn=2223-7704&rft_id=info:doi/10.1007/s40544-018-0238-2&rft_dat=%3Cproquest_doaj_%3E2100181571%3C/proquest_doaj_%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c425t-a19790e9c8be052db0bf703c262f855e3cb49d39df204b20f78935cf7234e0cb3%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_pqid=2100181571&rft_id=info:pmid/&rfr_iscdi=true |