Topological structures of transition metal dichalcogenides: A review on fabrication, effects, applications, and potential

• Published in: InfoMat 2021-02, Vol.3 (2), p.133-154
• Main Authors: Zhang, Weifeng, Zhang, Yan, Qiu, Jiakang, Zhao, Zihan, Liu, Nan
• Format: Article
• Language: English
• Subjects: field‐effect transistors (FETs); photodetectors; topological structures; transition metal dichalcogenides (TMDs)
• ISSN: 2567-3165; 2567-3165
• DOI: 10.1002/inf2.12156

Transition metal dichalcogenides (TMDs) have received tremendous attention owing to their potential for optoelectronic applications. Topological structures, such as wrinkles, folds, and scrolls, have been generated on TMDs, thereby exhibiting novel physical properties with improved optoelectronic performance, making them attractive prospects for both basic understanding and advanced applications in optoelectronics. In this review, the methods for fabricating wrinkles, folds, and scrolls on TMDs are outlined, including modification of the fabrication and transfer processes, and manipulation via auxiliary polymers. The effects on their physical and electronic properties are also discussed, with particular paid to the energy band structure, single‐photon sources, second harmonic generation (SHG), and interlayer coupling. In comparison to pristine TMDs, these topologies exhibit great advantages in optoelectronic devices, such as field‐effect transistors and photodetectors. Finally, existing challenges and opportunities of wrinkled, folded, and scrolled TMDs are outlined and an outlook is presented. Topological structures on transition metal dichalcogenides (TMDs), such as wrinkles, folds, and scrolls, generated by different fabrication methods impose different effects on the physical and electronic properties of the material. Among the most significant influence of topological structures is the enhanced optoelectronic performance of TMDs, thereby expanding their existing and future applications.