Features of Pinch Plasma, Electron, and Ion Beams That Originated in the AECS PF-1 Plasma Focus Device

• Published in: Plasma 2022-06, Vol.5 (2), p.184-195
• Main Authors: Akel, Mohamad, AL-Hawat, Sharif, Ahmad, Muthanna, Ballul, Yamen, Shaaban, Soliman
• Format: Article
• Language: English
• Subjects: electron and ion beam; Lee model; plasma focus; various gases
• ISSN: 2571-6182; 2571-6182
• DOI: 10.3390/plasma5020014

The measured current traces of alow energy AECS PF-1 plasma focus device are used for studying of the formed plasma, and the produced ion and electron beams. Anadapted version of the Lee model (RADPFV5.15FIB&REB) is applied, taking into account the fitting procedures between the measured and computed current waveforms for each shot. The experiments on AECSPF-1 were performed with three different gases—helium, nitrogen, and argon—for studying the effect of the atomic number on the properties of the generated beams. For numerical experiments using the Lee model, 36 successful shots for each gas were selected. The peak values of the total discharge current Ipeak were 50–55 kA, the pinch currents Ipinchwere34–36 kA, and the final pinch radius reached a minimum value of 0.03 cm for argon. The ion mean energy ranged from 35 keV (for He) to 223 keV (for Ar). The beam energy also had an extreme value of 1.34 J (0.05%E0) for argon. The results presented the highest values of 2.4 × 1014Wm−2 for the power flow density, and adamage factor of around 3.1 × 1010 Wm−2s0.5 for argon. For electron beams, the results also showed that the fluence and flux increased with the higher atomic number and reached a peak of 9.7 × 1022 m−2 and 5.9 × 1030 m−2 s−1 for argon, respectively. The results presented the highest values of 2.2 × 1016Wm−2 for the power flow density (heat flux), and adamage factor of around 3 × 1012 Wm−2s0.5 for argon. The kinetic energy of the relativistic electrons was found to be within the range of 18–23 keV. The results show that the ion and electron beam properties (energy, flux, fluence, ion and electron numbers, current, power flow density, and damage factor) emitted from the plasma focus had wide ranges based on the operational plasma focus parameters. Thus, these results could be used for selection of the suitable plasma focus parameters for desired material processing applications.