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Suppressing bias stress degradation in high performance solution processed organic transistors operating in air

Solution processed organic field effect transistors can become ubiquitous in flexible optoelectronics. While progress in material and device design has been astonishing, low environmental and operational stabilities remain longstanding problems obstructing their immediate deployment in real world ap...

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Published in:Nature communications 2021-04, Vol.12 (1), p.2352-10, Article 2352
Main Authors: Iqbal, Hamna F., Ai, Qianxiang, Thorley, Karl J., Chen, Hu, McCulloch, Iain, Risko, Chad, Anthony, John E., Jurchescu, Oana D.
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cited_by cdi_FETCH-LOGICAL-c606t-7b23462aae4c47d18ac4505128b352f5b41fe2218dc5783e49caedf9a742befb3
cites cdi_FETCH-LOGICAL-c606t-7b23462aae4c47d18ac4505128b352f5b41fe2218dc5783e49caedf9a742befb3
container_end_page 10
container_issue 1
container_start_page 2352
container_title Nature communications
container_volume 12
creator Iqbal, Hamna F.
Ai, Qianxiang
Thorley, Karl J.
Chen, Hu
McCulloch, Iain
Risko, Chad
Anthony, John E.
Jurchescu, Oana D.
description Solution processed organic field effect transistors can become ubiquitous in flexible optoelectronics. While progress in material and device design has been astonishing, low environmental and operational stabilities remain longstanding problems obstructing their immediate deployment in real world applications. Here, we introduce a strategy to identify the most probable and severe degradation pathways in organic transistors and then implement a method to eliminate the main sources of instabilities. Real time monitoring of the energetic distribution and transformation of electronic trap states during device operation, in conjunction with simulations, revealed the nature of traps responsible for performance degradation. With this information, we designed the most efficient encapsulation strategy for each device type, which resulted in fabrication of high performance, environmentally and operationally stable small molecule and polymeric transistors with consistent mobility and unparalleled threshold voltage shifts as low as 0.1 V under the application of high bias stress in air. Electrical instability of organic field-effect transistors (OFETs) during operation remains a challenge that limits the device’s real-world technological viability. Here, the authors report a method for diagnosing and suppressing bias stress in solution-processed OFETs operated in air.
doi_str_mv 10.1038/s41467-021-22683-2
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fullrecord <record><control><sourceid>proquest_doaj_</sourceid><recordid>TN_cdi_doaj_primary_oai_doaj_org_article_88663b30f82a4cabb723674d0f6693f6</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><doaj_id>oai_doaj_org_article_88663b30f82a4cabb723674d0f6693f6</doaj_id><sourcerecordid>2515930582</sourcerecordid><originalsourceid>FETCH-LOGICAL-c606t-7b23462aae4c47d18ac4505128b352f5b41fe2218dc5783e49caedf9a742befb3</originalsourceid><addsrcrecordid>eNp9kU1r3DAQhk1pSUKSP5BDEfTsRt-WL4US-hEI9ND0LEay5NWyK7mSXei_j3adpMmluuhj5n1mRm_TXBH8kWCmrgsnXHYtpqSlVCrW0jfNGcWctKSj7O2L82lzWcoW18V6ojg_aU4ZU4oJwc6a9HOZpuxKCXFEJkBBZT5c0eDGDAPMIUUUItqEcYMml33Ke4jWoZJ2yzE45WSrwA0o5RFisGjOEEsoc8oFpaqpkAqvEAj5onnnYVfc5eN-3vz6-uX-5nt79-Pb7c3nu9ZKLOe2M5RxSQEct7wbiALLBRaEKsME9cJw4h2lRA1WdIo53ltwg--h49Q4b9h5c7tyhwRbPeWwh_xXJwj6-FBb1ZDnYHdOKyUlMwx7RYFbMKb-mez4gL2UPfOysj6trGkxezdYF-uEu1fQ15EYNnpMf7TCEtO-r4APj4Ccfi-uzHqblhzr_JoKInqGhaI1i65ZNqdSsvPPFQjWB8_16rmunuuj5_ogev-yt2fJk8M1ga0JpYbi6PK_2v_BPgCNn7on</addsrcrecordid><sourcetype>Open Website</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>2515930582</pqid></control><display><type>article</type><title>Suppressing bias stress degradation in high performance solution processed organic transistors operating in air</title><source>Nature_系列刊</source><source>PubMed (Medline)</source><source>Access via ProQuest (Open Access)</source><source>Springer Nature - nature.com Journals - Fully Open Access</source><creator>Iqbal, Hamna F. ; Ai, Qianxiang ; Thorley, Karl J. ; Chen, Hu ; McCulloch, Iain ; Risko, Chad ; Anthony, John E. ; Jurchescu, Oana D.</creator><creatorcontrib>Iqbal, Hamna F. ; Ai, Qianxiang ; Thorley, Karl J. ; Chen, Hu ; McCulloch, Iain ; Risko, Chad ; Anthony, John E. ; Jurchescu, Oana D.</creatorcontrib><description>Solution processed organic field effect transistors can become ubiquitous in flexible optoelectronics. While progress in material and device design has been astonishing, low environmental and operational stabilities remain longstanding problems obstructing their immediate deployment in real world applications. Here, we introduce a strategy to identify the most probable and severe degradation pathways in organic transistors and then implement a method to eliminate the main sources of instabilities. Real time monitoring of the energetic distribution and transformation of electronic trap states during device operation, in conjunction with simulations, revealed the nature of traps responsible for performance degradation. With this information, we designed the most efficient encapsulation strategy for each device type, which resulted in fabrication of high performance, environmentally and operationally stable small molecule and polymeric transistors with consistent mobility and unparalleled threshold voltage shifts as low as 0.1 V under the application of high bias stress in air. Electrical instability of organic field-effect transistors (OFETs) during operation remains a challenge that limits the device’s real-world technological viability. Here, the authors report a method for diagnosing and suppressing bias stress in solution-processed OFETs operated in air.</description><identifier>ISSN: 2041-1723</identifier><identifier>EISSN: 2041-1723</identifier><identifier>DOI: 10.1038/s41467-021-22683-2</identifier><identifier>PMID: 33883553</identifier><language>eng</language><publisher>London: Nature Publishing Group UK</publisher><subject>119/118 ; 639/166/987 ; 639/301/1005/1007 ; Bias ; Blocking ; Fabrication ; Field effect transistors ; Humanities and Social Sciences ; multidisciplinary ; Optoelectronics ; Performance degradation ; Science ; Science (multidisciplinary) ; Semiconductor devices ; Stress ; Threshold voltage ; Transistors</subject><ispartof>Nature communications, 2021-04, Vol.12 (1), p.2352-10, Article 2352</ispartof><rights>The Author(s) 2021</rights><rights>The Author(s) 2021. This work is published under http://creativecommons.org/licenses/by/4.0/ (the “License”). Notwithstanding the ProQuest Terms and Conditions, you may use this content in accordance with the terms of the License.</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c606t-7b23462aae4c47d18ac4505128b352f5b41fe2218dc5783e49caedf9a742befb3</citedby><cites>FETCH-LOGICAL-c606t-7b23462aae4c47d18ac4505128b352f5b41fe2218dc5783e49caedf9a742befb3</cites><orcidid>0000-0002-6340-7217 ; 0000-0002-8972-1888 ; 0000-0003-2204-2909 ; 0000-0001-9978-4703 ; 0000-0001-9838-5233</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://www.proquest.com/docview/2515930582/fulltextPDF?pq-origsite=primo$$EPDF$$P50$$Gproquest$$Hfree_for_read</linktopdf><linktohtml>$$Uhttps://www.proquest.com/docview/2515930582?pq-origsite=primo$$EHTML$$P50$$Gproquest$$Hfree_for_read</linktohtml><link.rule.ids>230,314,727,780,784,885,25753,27924,27925,37012,44590,53791,53793,75126</link.rule.ids><backlink>$$Uhttps://www.ncbi.nlm.nih.gov/pubmed/33883553$$D View this record in MEDLINE/PubMed$$Hfree_for_read</backlink></links><search><creatorcontrib>Iqbal, Hamna F.</creatorcontrib><creatorcontrib>Ai, Qianxiang</creatorcontrib><creatorcontrib>Thorley, Karl J.</creatorcontrib><creatorcontrib>Chen, Hu</creatorcontrib><creatorcontrib>McCulloch, Iain</creatorcontrib><creatorcontrib>Risko, Chad</creatorcontrib><creatorcontrib>Anthony, John E.</creatorcontrib><creatorcontrib>Jurchescu, Oana D.</creatorcontrib><title>Suppressing bias stress degradation in high performance solution processed organic transistors operating in air</title><title>Nature communications</title><addtitle>Nat Commun</addtitle><addtitle>Nat Commun</addtitle><description>Solution processed organic field effect transistors can become ubiquitous in flexible optoelectronics. While progress in material and device design has been astonishing, low environmental and operational stabilities remain longstanding problems obstructing their immediate deployment in real world applications. Here, we introduce a strategy to identify the most probable and severe degradation pathways in organic transistors and then implement a method to eliminate the main sources of instabilities. Real time monitoring of the energetic distribution and transformation of electronic trap states during device operation, in conjunction with simulations, revealed the nature of traps responsible for performance degradation. With this information, we designed the most efficient encapsulation strategy for each device type, which resulted in fabrication of high performance, environmentally and operationally stable small molecule and polymeric transistors with consistent mobility and unparalleled threshold voltage shifts as low as 0.1 V under the application of high bias stress in air. Electrical instability of organic field-effect transistors (OFETs) during operation remains a challenge that limits the device’s real-world technological viability. Here, the authors report a method for diagnosing and suppressing bias stress in solution-processed OFETs operated in air.</description><subject>119/118</subject><subject>639/166/987</subject><subject>639/301/1005/1007</subject><subject>Bias</subject><subject>Blocking</subject><subject>Fabrication</subject><subject>Field effect transistors</subject><subject>Humanities and Social Sciences</subject><subject>multidisciplinary</subject><subject>Optoelectronics</subject><subject>Performance degradation</subject><subject>Science</subject><subject>Science (multidisciplinary)</subject><subject>Semiconductor devices</subject><subject>Stress</subject><subject>Threshold voltage</subject><subject>Transistors</subject><issn>2041-1723</issn><issn>2041-1723</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2021</creationdate><recordtype>article</recordtype><sourceid>PIMPY</sourceid><sourceid>DOA</sourceid><recordid>eNp9kU1r3DAQhk1pSUKSP5BDEfTsRt-WL4US-hEI9ND0LEay5NWyK7mSXei_j3adpMmluuhj5n1mRm_TXBH8kWCmrgsnXHYtpqSlVCrW0jfNGcWctKSj7O2L82lzWcoW18V6ojg_aU4ZU4oJwc6a9HOZpuxKCXFEJkBBZT5c0eDGDAPMIUUUItqEcYMml33Ke4jWoZJ2yzE45WSrwA0o5RFisGjOEEsoc8oFpaqpkAqvEAj5onnnYVfc5eN-3vz6-uX-5nt79-Pb7c3nu9ZKLOe2M5RxSQEct7wbiALLBRaEKsME9cJw4h2lRA1WdIo53ltwg--h49Q4b9h5c7tyhwRbPeWwh_xXJwj6-FBb1ZDnYHdOKyUlMwx7RYFbMKb-mez4gL2UPfOysj6trGkxezdYF-uEu1fQ15EYNnpMf7TCEtO-r4APj4Ccfi-uzHqblhzr_JoKInqGhaI1i65ZNqdSsvPPFQjWB8_16rmunuuj5_ogev-yt2fJk8M1ga0JpYbi6PK_2v_BPgCNn7on</recordid><startdate>20210421</startdate><enddate>20210421</enddate><creator>Iqbal, Hamna F.</creator><creator>Ai, Qianxiang</creator><creator>Thorley, Karl J.</creator><creator>Chen, Hu</creator><creator>McCulloch, Iain</creator><creator>Risko, Chad</creator><creator>Anthony, John E.</creator><creator>Jurchescu, Oana D.</creator><general>Nature Publishing Group UK</general><general>Nature Publishing Group</general><general>Nature Portfolio</general><scope>C6C</scope><scope>NPM</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>3V.</scope><scope>7QL</scope><scope>7QP</scope><scope>7QR</scope><scope>7SN</scope><scope>7SS</scope><scope>7ST</scope><scope>7T5</scope><scope>7T7</scope><scope>7TM</scope><scope>7TO</scope><scope>7X7</scope><scope>7XB</scope><scope>88E</scope><scope>8AO</scope><scope>8FD</scope><scope>8FE</scope><scope>8FG</scope><scope>8FH</scope><scope>8FI</scope><scope>8FJ</scope><scope>8FK</scope><scope>ABUWG</scope><scope>AFKRA</scope><scope>ARAPS</scope><scope>AZQEC</scope><scope>BBNVY</scope><scope>BENPR</scope><scope>BGLVJ</scope><scope>BHPHI</scope><scope>C1K</scope><scope>CCPQU</scope><scope>DWQXO</scope><scope>FR3</scope><scope>FYUFA</scope><scope>GHDGH</scope><scope>GNUQQ</scope><scope>H94</scope><scope>HCIFZ</scope><scope>K9.</scope><scope>LK8</scope><scope>M0S</scope><scope>M1P</scope><scope>M7P</scope><scope>P5Z</scope><scope>P62</scope><scope>P64</scope><scope>PIMPY</scope><scope>PQEST</scope><scope>PQQKQ</scope><scope>PQUKI</scope><scope>PRINS</scope><scope>RC3</scope><scope>SOI</scope><scope>5PM</scope><scope>DOA</scope><orcidid>https://orcid.org/0000-0002-6340-7217</orcidid><orcidid>https://orcid.org/0000-0002-8972-1888</orcidid><orcidid>https://orcid.org/0000-0003-2204-2909</orcidid><orcidid>https://orcid.org/0000-0001-9978-4703</orcidid><orcidid>https://orcid.org/0000-0001-9838-5233</orcidid></search><sort><creationdate>20210421</creationdate><title>Suppressing bias stress degradation in high performance solution processed organic transistors operating in air</title><author>Iqbal, Hamna F. ; Ai, Qianxiang ; Thorley, Karl J. ; Chen, Hu ; McCulloch, Iain ; Risko, Chad ; Anthony, John E. ; Jurchescu, Oana D.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c606t-7b23462aae4c47d18ac4505128b352f5b41fe2218dc5783e49caedf9a742befb3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2021</creationdate><topic>119/118</topic><topic>639/166/987</topic><topic>639/301/1005/1007</topic><topic>Bias</topic><topic>Blocking</topic><topic>Fabrication</topic><topic>Field effect transistors</topic><topic>Humanities and Social Sciences</topic><topic>multidisciplinary</topic><topic>Optoelectronics</topic><topic>Performance degradation</topic><topic>Science</topic><topic>Science (multidisciplinary)</topic><topic>Semiconductor devices</topic><topic>Stress</topic><topic>Threshold voltage</topic><topic>Transistors</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Iqbal, Hamna F.</creatorcontrib><creatorcontrib>Ai, Qianxiang</creatorcontrib><creatorcontrib>Thorley, Karl J.</creatorcontrib><creatorcontrib>Chen, Hu</creatorcontrib><creatorcontrib>McCulloch, Iain</creatorcontrib><creatorcontrib>Risko, Chad</creatorcontrib><creatorcontrib>Anthony, John E.</creatorcontrib><creatorcontrib>Jurchescu, Oana D.</creatorcontrib><collection>Springer Nature OA Free Journals</collection><collection>PubMed</collection><collection>CrossRef</collection><collection>ProQuest Central (Corporate)</collection><collection>Bacteriology Abstracts (Microbiology B)</collection><collection>Calcium &amp; Calcified Tissue Abstracts</collection><collection>Chemoreception Abstracts</collection><collection>Ecology Abstracts</collection><collection>Entomology Abstracts (Full archive)</collection><collection>Environment Abstracts</collection><collection>Immunology Abstracts</collection><collection>Industrial and Applied Microbiology Abstracts (Microbiology A)</collection><collection>Nucleic Acids Abstracts</collection><collection>Oncogenes and Growth Factors Abstracts</collection><collection>ProQuest Health and Medical</collection><collection>ProQuest Central (purchase pre-March 2016)</collection><collection>Medical Database (Alumni Edition)</collection><collection>ProQuest Pharma Collection</collection><collection>Technology Research Database</collection><collection>ProQuest SciTech Collection</collection><collection>ProQuest Technology Collection</collection><collection>ProQuest Natural Science Collection</collection><collection>Hospital Premium Collection</collection><collection>Hospital Premium Collection (Alumni Edition)</collection><collection>ProQuest Central (Alumni) (purchase pre-March 2016)</collection><collection>ProQuest Central (Alumni)</collection><collection>ProQuest Central</collection><collection>Advanced Technologies &amp; Aerospace Database‎ (1962 - current)</collection><collection>ProQuest Central Essentials</collection><collection>Biological Science Collection</collection><collection>ProQuest Central</collection><collection>Technology Collection</collection><collection>ProQuest Natural Science Collection</collection><collection>Environmental Sciences and Pollution Management</collection><collection>ProQuest One Community College</collection><collection>ProQuest Central</collection><collection>Engineering Research Database</collection><collection>Health Research Premium Collection</collection><collection>Health Research Premium Collection (Alumni)</collection><collection>ProQuest Central Student</collection><collection>AIDS and Cancer Research Abstracts</collection><collection>SciTech Premium Collection</collection><collection>ProQuest Health &amp; Medical Complete (Alumni)</collection><collection>ProQuest Biological Science Collection</collection><collection>Health &amp; Medical Collection (Alumni Edition)</collection><collection>Medical Database</collection><collection>ProQuest Biological Science Journals</collection><collection>ProQuest advanced technologies &amp; aerospace journals</collection><collection>ProQuest Advanced Technologies &amp; Aerospace Collection</collection><collection>Biotechnology and BioEngineering Abstracts</collection><collection>Access via ProQuest (Open Access)</collection><collection>ProQuest One Academic Eastern Edition (DO NOT USE)</collection><collection>ProQuest One Academic</collection><collection>ProQuest One Academic UKI Edition</collection><collection>ProQuest Central China</collection><collection>Genetics Abstracts</collection><collection>Environment Abstracts</collection><collection>PubMed Central (Full Participant titles)</collection><collection>Directory of Open Access Journals</collection><jtitle>Nature communications</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Iqbal, Hamna F.</au><au>Ai, Qianxiang</au><au>Thorley, Karl J.</au><au>Chen, Hu</au><au>McCulloch, Iain</au><au>Risko, Chad</au><au>Anthony, John E.</au><au>Jurchescu, Oana D.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Suppressing bias stress degradation in high performance solution processed organic transistors operating in air</atitle><jtitle>Nature communications</jtitle><stitle>Nat Commun</stitle><addtitle>Nat Commun</addtitle><date>2021-04-21</date><risdate>2021</risdate><volume>12</volume><issue>1</issue><spage>2352</spage><epage>10</epage><pages>2352-10</pages><artnum>2352</artnum><issn>2041-1723</issn><eissn>2041-1723</eissn><abstract>Solution processed organic field effect transistors can become ubiquitous in flexible optoelectronics. While progress in material and device design has been astonishing, low environmental and operational stabilities remain longstanding problems obstructing their immediate deployment in real world applications. Here, we introduce a strategy to identify the most probable and severe degradation pathways in organic transistors and then implement a method to eliminate the main sources of instabilities. Real time monitoring of the energetic distribution and transformation of electronic trap states during device operation, in conjunction with simulations, revealed the nature of traps responsible for performance degradation. With this information, we designed the most efficient encapsulation strategy for each device type, which resulted in fabrication of high performance, environmentally and operationally stable small molecule and polymeric transistors with consistent mobility and unparalleled threshold voltage shifts as low as 0.1 V under the application of high bias stress in air. Electrical instability of organic field-effect transistors (OFETs) during operation remains a challenge that limits the device’s real-world technological viability. Here, the authors report a method for diagnosing and suppressing bias stress in solution-processed OFETs operated in air.</abstract><cop>London</cop><pub>Nature Publishing Group UK</pub><pmid>33883553</pmid><doi>10.1038/s41467-021-22683-2</doi><tpages>10</tpages><orcidid>https://orcid.org/0000-0002-6340-7217</orcidid><orcidid>https://orcid.org/0000-0002-8972-1888</orcidid><orcidid>https://orcid.org/0000-0003-2204-2909</orcidid><orcidid>https://orcid.org/0000-0001-9978-4703</orcidid><orcidid>https://orcid.org/0000-0001-9838-5233</orcidid><oa>free_for_read</oa></addata></record>
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2041-1723
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recordid cdi_doaj_primary_oai_doaj_org_article_88663b30f82a4cabb723674d0f6693f6
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subjects 119/118
639/166/987
639/301/1005/1007
Bias
Blocking
Fabrication
Field effect transistors
Humanities and Social Sciences
multidisciplinary
Optoelectronics
Performance degradation
Science
Science (multidisciplinary)
Semiconductor devices
Stress
Threshold voltage
Transistors
title Suppressing bias stress degradation in high performance solution processed organic transistors operating in air
url http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-01T12%3A09%3A48IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_doaj_&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Suppressing%20bias%20stress%20degradation%20in%20high%20performance%20solution%20processed%20organic%20transistors%20operating%20in%20air&rft.jtitle=Nature%20communications&rft.au=Iqbal,%20Hamna%20F.&rft.date=2021-04-21&rft.volume=12&rft.issue=1&rft.spage=2352&rft.epage=10&rft.pages=2352-10&rft.artnum=2352&rft.issn=2041-1723&rft.eissn=2041-1723&rft_id=info:doi/10.1038/s41467-021-22683-2&rft_dat=%3Cproquest_doaj_%3E2515930582%3C/proquest_doaj_%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c606t-7b23462aae4c47d18ac4505128b352f5b41fe2218dc5783e49caedf9a742befb3%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_pqid=2515930582&rft_id=info:pmid/33883553&rfr_iscdi=true