Functionalized MoS2 Nanoflowers with Excellent Near-Infrared Photothermal Activities for Scavenging of Antibiotic Resistant Bacteria

Presently, antibiotic resistant bacteria (ARB) have been commonly found in environment, such as air, soil and lakes. Therefore, it is urgent and necessary to prepare antimicrobial agents with excellent anti-antibiotic resistant bacteria. In our research, poly-ethylene glycol functionalized molybdenu...

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Bibliographic Details
Published in:Nanomaterials (Basel, Switzerland) Switzerland), 2021-10, Vol.11 (11), p.2829
Main Authors: Liu, Lulu, Wu, Wanfeng, Fang, Yan, Liu, Haoqiang, Chen, Fei, Zhang, Minwei, Qin, Yanan
Format: Article
Language:English
Subjects:
antibacterial
Antibiotic resistance
Antibiotics
antibiotics resistant bacteria
Antiinfectives and antibacterials
Antimicrobial agents
Bacteria
Drug resistance
Efficiency
Ethylene glycol
Genes
Genomes
Glutathione
Irradiation
Lakes
Molybdenum
Molybdenum disulfide
MoS2 nanoflowers
Nanomaterials
Nanoparticles
Oxidation
Pathogens
Photothermal conversion
Polyethylene glycol
Radiation
Scavenging
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Summary:Presently, antibiotic resistant bacteria (ARB) have been commonly found in environment, such as air, soil and lakes. Therefore, it is urgent and necessary to prepare antimicrobial agents with excellent anti-antibiotic resistant bacteria. In our research, poly-ethylene glycol functionalized molybdenum disulfide nanoflowers (PEG-MoS2 NFs) were synthesized via a one-step hydrothermal method. As-prepared PEG-MoS2 NFs displayed excellent photothermal conversion efficiency (30.6%) and photothermal stability. Under 808 nm NIR laser irradiation for 10 min, the inhibition rate of tetracycline-resistant Bacillus tropicalis and Stenotrophomonas malphilia reached more than 95% at the concentration of 50 μg/mL. More interestingly, the photothermal effect of PEG-MoS2 NFs could accelerate the oxidation of glutathione, resulting in the rapid death of bacteria. A functionalized PEG-MoS2 NFs photothermal anti-antibiotic resistant system was constructed successfully.
ISSN:2079-4991
2079-4991
DOI:10.3390/nano11112829