Comprehensive Power Gain Assessment of GaN-SOI-FinFET for Improved RF/Wireless Performance Using TCAD

In this work, we present a radio frequency (RF) assessment of the nanoscale gallium nitride-silicon-on-insulator fin field-effect transistor (GaN-SOI-FinFET). All the performances of the device were compared with GaN-FinFET and conventional FinFET (Conv. FinFET) simultaneously. All the results show...

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Bibliographic Details
Published in:Micromachines (Basel) 2022-08, Vol.13 (9), p.1418
Main Authors: Kumar, Ajay, Gupta, Neha, Goyal, Amit Kumar, Massoud, Yehia
Format: Article
Language:English
Subjects:
cut-off frequency
Design
Field effect transistors
Gallium nitrides
GaN-SOI-FinFET
Liquors
maximum oscillator frequency
Parasitics (electronics)
Power gain
power gains
Radio frequency
Semiconductor devices
Silicon
Simulation
SOI (semiconductors)
Terahertz frequencies
Thickness
Transistors
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Summary:In this work, we present a radio frequency (RF) assessment of the nanoscale gallium nitride-silicon-on-insulator fin field-effect transistor (GaN-SOI-FinFET). All the performances of the device were compared with GaN-FinFET and conventional FinFET (Conv. FinFET) simultaneously. All the results show that the power gains significantly improved in terms of Gma, Gms, Stern stability factor (SS), GMT, and intrinsic delay in comparison with conventional FinFET. Current gain and unilateral power gain were also evaluated for the extraction of fT (cut-off frequency) and fMAX, respectively. fT and fMAX were enhanced by 88.8% and 94.6%, respectively. This analysis was performed at several THz frequencies. Further, the parametric assessment was also performed in terms of gate length and oxide thickness to find the optimized value of gate length and oxide thickness. The implementation of GaN in the channel reduces the parasitic capacitance and paves the way for high-performance RF applications.
ISSN:2072-666X
2072-666X
DOI:10.3390/mi13091418