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Psychometric properties of the Polish adaptation of Technostress Creators and Technostress Inhibitors Scale
Background: The use of information and communication technologies by employees of organizations may cause technostress for their users. The sources of technostress in organizations are techno-overload, techno-invasion, techno-complexity, techno-insecurity, techno-uncertainty. An organization may als...
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Published in: | Medycyna pracy 2022-07, Vol.73 (4), p.277-293 |
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Main Author: | |
Format: | Article |
Language: | English |
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Citations: | Items that cite this one |
Online Access: | Get full text |
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Summary: | Background: The use of information and communication technologies by employees of organizations may cause technostress for their users. The sources of technostress in organizations are techno-overload, techno-invasion, techno-complexity, techno-insecurity, techno-uncertainty. An organization may also have technostress inhibitors that counteract the experience of technostress. Material and Methods: The purpose of this research was to determine the psychometric properties of the Polish adaptation of Technostress Creators and Technostress Inhibitors Scale. Results: In the first study (N = 632), the 8-factor structure of the questionnaire was confirmed by the use of confirmatory factor analysis (CFA). Furthermore, a high internal consistency of the adapted method was obtained. The second study (N = 451) confirmed the external validity of the adapted method by correlating it with the Perceived Stress Scale. The third study (N = 123) confirmed high stability at the time of results obtained in 2 measurements with the adapted scale. Conclusions: To conclude, it can be stated that the Polish adaptation of the Technostress Creators and Technostress Inhibitors Scale is characterized by good psychometric indicators and can be successfully used in various organizations in the diagnosis and reduction of technostress. Med Pr. 2022;73(4):277-93 Key words: reliability, information and communication technologies, technostress, technostress creators, technostress inhibitors, Polish adaptation |
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ISSN: | 0465-5893 2353-1339 |
DOI: | 10.13075/mp.5893.01236 |