The corrosion resistance and microstructure of UBM system-deposited NbxSiyNz thin films

NbxSiyNz thin film nanostructure was grown using the unbalanced magnetron sputtering (UBM) technique with varying Si content. Corrosion resistance was evaluated by potentiodynamic polarisation technique in a 3% NaCl solution. Microstructure was analysed by X-ray diffraction (XRD), scanning electron...

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Bibliographic Details
Published in:Ingeniería e investigación 2012-09, Vol.32 (3), p.10-13
Main Authors: VELASCO, L, OLAYA, J. J, RODRIGUEZ-BARACALDO, R
Format: Article
Language:English
Subjects:
Applied sciences
Corrosion
Corrosion prevention
diffraction
Exact sciences and technology
fluorescence
Metals. Metallurgy
microscopy
microstructure
polarisation
race track
spectroscopy
sputtering
thin film
x ray
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Summary:NbxSiyNz thin film nanostructure was grown using the unbalanced magnetron sputtering (UBM) technique with varying Si content. Corrosion resistance was evaluated by potentiodynamic polarisation technique in a 3% NaCl solution. Microstructure was analysed by X-ray diffraction (XRD), scanning electron microscopy (SEM) and laser scanning microscopy. Chemical composition was ascertained by X-ray fluorescence (XRF) technique. The results showed that deposition rates increased with higher Si content. A microstructural change was observed for greater than 5% Si content through the transition from a crystalline to an amorphous structure in the thin films. Corrosion test results demonstrated that the thin films having the highest silicon content had better corrosion resistance.
ISSN:0120-5609
2248-8723
DOI:10.15446/ing.investig.v32n3.35932