Polarized holographic lithography system for high-uniformity microscale patterning with periodic tunability

Periodic microscale array structures play an important role in diverse applications involving photonic crystals and diffraction gratings. A polarized holographic lithography system is proposed for patterning high-uniformity microscale two-dimensional crossed-grating structures with periodic tunabili...

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Bibliographic Details
Published in:Microsystems & nanoengineering 2021-04, Vol.7 (1), p.31-31, Article 31
Main Authors: Xue, Gaopeng, Zhai, Qihang, Lu, Haiou, Zhou, Qian, Ni, Kai, Lin, Liyu, Wang, Xiaohao, Li, Xinghui
Format: Article
Language:English
Subjects:
639/624/399/354
639/624/400/1113
Arrays
Crystal structure
Crystals
Diffraction patterns
Dimensional stability
Engineering
Gratings (spectra)
Holography
Interference fringes
Lithography
Patterning
Photonic crystals
Polarization
Polarization modulation
Three dimensional models
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Summary:Periodic microscale array structures play an important role in diverse applications involving photonic crystals and diffraction gratings. A polarized holographic lithography system is proposed for patterning high-uniformity microscale two-dimensional crossed-grating structures with periodic tunability. Orthogonal two-axis Lloyd’s mirror interference and polarization modulation produce three sub-beams, enabling the formation of two-dimensional crossed-grating patterns with wavelength-comparable periods by a single exposure. The two-dimensional-pattern period can also be flexibly tuned by adjusting the interferometer spatial positioning. Polarization states of three sub-beams, defining the uniformity of the interference fringes, are modulated at their initial-polarization states based on a strict full polarization tracing model in a three-dimensional space. A polarization modulation model is established considering two conditions of eliminating the unexpected interference and providing the desired identical interference intensities. The proposed system is a promising approach for fabricating high-uniformity two-dimensional crossed gratings with a relatively large grating period range of 500–1500 nm. Moreover, our rapid and stable approach for patterning period-tunable two-dimensional-array microstructures with high uniformity could be applicable to other multibeam interference lithography techniques.
ISSN:2055-7434
2096-1030
2055-7434
DOI:10.1038/s41378-021-00256-z