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Author Correction: Improved oxidation behavior of Hf0.11Al0.20B0.69 in comparison to Hf0.28B0.72 magnetron sputtered thin films

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Bibliographic Details
Published in:	Scientific reports 2024-10, Vol.14 (1), p.25223-1, Article 25223
Main Authors:	Kümmerl, Pauline, Lellig, Sebastian, Navidi Kashani, Amir Hossein, Hans, Marcus, Pöllmann, Peter J., Löfler, Lukas, Nayak, Ganesh Kumar, Holzapfel, Damian M., Kolozsvári, Szilárd, Polcik, Peter, Schweizer, Peter, Primetzhofer, Daniel, Michler, Johann, Schneider, Jochen M.
Format:	Article
Language:	English
Subjects:	Author Correction Humanities and Social Sciences multidisciplinary Science Science (multidisciplinary) Thin films
Online Access:	Get full text
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