Density Functional Investigation of [001] and [111] SiNWs and the Effect of Doping with Boron and Phosphorus

• Published in: Crystals (Basel) 2024-07, Vol.14 (7), p.585
• Main Authors: Al-Nuaimi, Nedhal Ali Mahmood, Hilser, Florian, Gemming, Sibylle
• Format: Article
• Language: English
• Subjects: ABINIT; Atomic properties; Atomic structure; band structure; Boron; Chemical vapor deposition; Conduction bands; Density; Doping; Electron states; Investigations; Nanowires; Phosphorus; Physical properties; Si nanowire; Silicon; simulation; Software; Specific gravity; Wire
• ISSN: 2073-4352; 2073-4352
• DOI: 10.3390/cryst14070585

In the present study, we investigate the influence of boron (B) and phosphorus (P) (p- and n-type, respectively) doping on the electronic properties of ultra-thin silicon nanowires (SiNWs) by gradient-corrected density functional calculations with the Perdew–Burke–Ernzerhof (PBE) approximation. In the limit of very small diameters (5–8 Å), both pristine and highly active unsaturated SiNWs with orientations along the [001] and [111] directions exhibit electronic states around the Fermi level, indicative of conductive properties. Conduction is further enhanced by the introduction of doping atoms, as demonstrated by the relative change in the band structures of SiNWs with and without B and P doping. This investigation provides an important insight into the electronic states of SiNWs, which are candidates for future electronics or sensing applications.