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Effects of etching and adhesive applications on the bond strength between composite resin and glass-ionomer cements

This study determined the effects of various surface treatment modalities on the bond strength of composite resins to glass-ionomer cements. Conventional (Ketac Molar Quick Applicap) or resin-modified (Photac Fil Quick Aplicap) glass-ionomer cements were prepared. Two-step etch-rinse & bond adhe...

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Bibliographic Details
Published in:Journal of applied oral science 2012-12, Vol.20 (6), p.636-642
Main Authors: Pamir, Tijen, Sen, Bilge Hakan, Evcin, Ozgür
Format: Article
Language:English
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Summary:This study determined the effects of various surface treatment modalities on the bond strength of composite resins to glass-ionomer cements. Conventional (Ketac Molar Quick Applicap) or resin-modified (Photac Fil Quick Aplicap) glass-ionomer cements were prepared. Two-step etch-rinse & bond adhesive (Adper Single Bond 2) or single-step self-etching adhesive (Adper Prompt L-Pop) was applied to the set cements. In the etch-rinse & bond group, the sample surfaces were pre-treated as follows: (1) no etching, (2) 15 s of etching with 35% phosphoric acid, (3) 30 s of etching, and (4) 60 s of etching. Following the placement of the composite resin (Filtek Z250), the bond strength was measured in a universal testing machine and the data obtained were analyzed with the two-way analysis of variance (ANOVA) followed by the Tukey's HSD post hoc analysis (p=0.05). Then, the fractured surfaces were examined by scanning electron microscopy. The bond strength of the composite resin to the conventional glass-ionomer cement was significantly lower than that to the resin-modified glass-ionomer cement (p0.05). However, a greater bond strength was obtained with 30 s of phosphoric acid application. The resin-modified glass-ionomer cement improved the bond strength of the composite resin to the glass-ionomer cement. Both etch-rinse & bond and self-etching adhesives may be used effectively in the lamination of glass-ionomer cements. However, an etching time of at least 30 s appears to be optimal.
ISSN:1678-7757
1678-7765
1678-7765
1678-7757
DOI:10.1590/S1678-77572012000600008