Ultra-slow growth rate: Accurate control of the thickness of porous anodic aluminum oxide films

[Display omitted] •Ultra-slow rate of growth (νa ~ 1.4 nm min−1) of porous anodic aluminum oxide (PAAO) films has been achieved.•PAAO films with precisely controllable thickness and excellent regularity have been prepared.•The νa obtained was four times slower than the previously reported minimum va...

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Bibliographic Details
Published in:Electrochemistry communications 2019-12, Vol.109, p.106602, Article 106602
Main Authors: Wu, Jingcheng, Li, Yi, Li, Zhengxiang, Li, Shize, Shen, Le, Hu, Xing, Ling, Zhiyuan
Format: Article
Language:English
Subjects:
Anodization
Growth rate
Low temperature
PAAO
Porous anodic aluminum oxide
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Summary:[Display omitted] •Ultra-slow rate of growth (νa ~ 1.4 nm min−1) of porous anodic aluminum oxide (PAAO) films has been achieved.•PAAO films with precisely controllable thickness and excellent regularity have been prepared.•The νa obtained was four times slower than the previously reported minimum value.•The results should be helpful in expanding the application range of ultrathin PAAO films. Porous anodic aluminum oxide (PAAO) films have attracted widespread attention because they can be used as porous templates for the preparation of various nanomaterials. However, there are still some challenges. For example, although fine control of the thickness of AAO films is generally quite easy to achieve, it is difficult to control the thickness of extremely thin films (e.g.
ISSN:1388-2481
1873-1902
DOI:10.1016/j.elecom.2019.106602