Performance and reliability improvement in intercalated MLGNR interconnects using optimized aspect ratio

• Published in: Scientific reports 2022-01, Vol.12 (1), p.1475-1475, Article 1475
• Main Authors: Kumari, Bhawana, Sharma, Rohit, Sahoo, Manodipan
• Format: Article
• Language: English
• Subjects: 639/166; 639/166/987; Fabrication; Ferric chloride; Humanities and Social Sciences; Mathematical models; multidisciplinary; Noise; Scaling; Science; Science (multidisciplinary)
• ISSN: 2045-2322; 2045-2322
• DOI: 10.1038/s41598-022-05222-x

In this work, aspect ratio of various intercalation doped MLGNR interconnects are optimized using a numerical approach to achieve improved performance and reliability. A numerical optimization method is presented to estimate optimized aspect ratio considering combined effects of performance, noise and reliability metrics for any arbitrary nano interconnect system. This approach is cost effective and will be extremely useful to industry for selection of aspect ratio of interconnects as it is a non-SPICE method and reduces fabrication iterations for achieving desired performance and reliability. Our numerical method suggests that by minimizing the figure of merit (i.e. Noise Delay Power Product / Breakdown Power P BD ratio), aspect ratio of FeCl 3 doped MLGNR interconnect is optimized at 0.987, 0.61 and 0.579 for local, intermediate and global level, respectively at 7 nm node. Comparing the optimized performance metrics in this work with the estimated metrics at prescribed aspect ratio by IRDS roadmap, delay, noise delay product ( NDP ), power delay product ( PDP ), P D P / P BD ratio and figure of merit are improved by ( ∼ 2% and ∼ 25%), ( ∼ 44% and ∼ 50%), ( ∼ 9% and ∼ 48%), ( ∼ 6% and ∼ 48%) and ( ∼ 49% and ∼ 68%) for 10 μ m and 1 mm long Fecl 3 doped MLGNR interconnect, respectively at 7 nm node. Increase in contact resistance leads to significant decrease in performance and increase in optimized aspect ratio of local Fecl 3 doped MLGNR interconnect. Scaling down from 10 to 7 nm node results in increase of optimized aspect ratio in all levels of interconnects. Even though the performance of MLGNR degrades with scaling down but when compared to copper, the performance improves with technology scaling. Finally, this study provides circuit designers a detailed guideline for selecting an optimized aspect ratio for achieving better performance, power efficiency and reliability in doped MLGNR interconnects.