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Synthesis of Large-Sized van der Waals Layered MoO3 Single Crystals with Improved Dielectric Performance

The applications of two-dimensional semiconductors strictly require the reliable integration of ultrathin high-κ dielectric materials on the semiconductor surface to enable fine gate control and low power consumption. As layered oxide materials, MoO3 can be potentially used as a high-κ two-dimension...

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Bibliographic Details
Published in:Precision Chemistry 2024-08, Vol.2 (8), p.406-413
Main Authors: Zhu, Yaqi, Yu, Beiming, Liu, Xin, Zhang, Jialin, Shi, Zhuofeng, Hu, Zhaoning, Bu, Saiyu, Li, Chunhu, Zhang, Xiaodong, Lin, Li
Format: Article
Language:English
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Summary:The applications of two-dimensional semiconductors strictly require the reliable integration of ultrathin high-κ dielectric materials on the semiconductor surface to enable fine gate control and low power consumption. As layered oxide materials, MoO3 can be potentially used as a high-κ two-dimensional material with a larger bandgap and high electron affinity. In this work, relying on the oxidization of molybdenum chlorides, we have synthesized α-MoO3 single crystals, which can be easily exfoliated into flakes with thicknesses of a few nanometers and sizes of hundreds of micrometers and fine thermal stability. Based on measurement results of conventional metal/insulator/metal devices and graphene based dual-gate devices, the as-received MoO3 nanosheets exhibit improved dielectric performance, including high dielectric constants and competitive breakdown field strength. Our work demonstrates that MoO3 with improved crystalline quality is a promising candidate for dielectric materials with a large gate capacitance in future electronics based on two-dimensional materials.
ISSN:2771-9316
2771-9316
DOI:10.1021/prechem.4c00014