Oxidative chemical vapor deposition of polyaniline thin films

Polyaniline (PANI) is synthesized via oxidative chemical vapor deposition (oCVD) using aniline as monomer and antimony pentachloride as oxidant. Microscopy and spectroscopy indicate that oCVD processing conditions influence the PANI film chemistry, oxidation, and doping level. Fourier transform infr...

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Bibliographic Details
Published in:Beilstein journal of nanotechnology 2017-06, Vol.8 (1), p.1266-1276
Main Authors: Smolin, Yuriy Y, Soroush, Masoud, Lau, Kenneth K S
Format: Article
Language:English
Subjects:
Aniline
Antimony
Chemical synthesis
Chemical vapor deposition
Chemistry
conducting polymers
emeraldine oxidation state
Fourier transforms
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Glass substrates
Lasers
Microscopy
Monomers
Morphology
Nanoscience
Nanotechnology
Nitrogen
Oligomers
Oxidation
oxidative chemical vapor deposition
Oxidizing agents
Photoelectrons
polyaniline
Polyanilines
Polymer films
Polymerization
Polymers
Silicon wafers
Substrates
thin film processing
Thin films
Valence
X ray photoelectron spectroscopy
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Summary:Polyaniline (PANI) is synthesized via oxidative chemical vapor deposition (oCVD) using aniline as monomer and antimony pentachloride as oxidant. Microscopy and spectroscopy indicate that oCVD processing conditions influence the PANI film chemistry, oxidation, and doping level. Fourier transform infrared spectroscopy (FTIR), scanning electron microscopy (SEM), and X-ray photoelectron spectroscopy (XPS) indicate that a substrate temperature of 90 °C is needed to minimize the formation of oligomers during polymerization. Lower substrate temperatures, such as 25 °C, lead to a film that mostly includes oligomers. Increasing the oxidant flowrate to nearly match the monomer flowrate favors the deposition of PANI in the emeraldine state, and varying the oxidant flowrate can directly influence the oxidation state of PANI. Changing the reactor pressure from 700 to 35 mTorr does not have a significant effect on the deposited film chemistry, indicating that the oCVD PANI process is not concentration dependent. This work shows that oCVD can be used for depositing PANI and for effectively controlling the chemical state of PANI.
ISSN:2190-4286
2190-4286
DOI:10.3762/bjnano.8.128