Chemical vapour deposition of diamond using low pressure flat combustion flame

Diamond coatings were deposited onto Mo and WC-Co substrates using a low pressure premixed acetylene-oxygen flat flame by means of a special apparatus operating at 50 mbar. Uniform diamond coatings containing significant amounts of non-diamond carbon were deposited over areas of »7 cm2 onto Mo subst...

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Bibliographic Details
Published in:Journal of the Serbian Chemical Society 2006-01, Vol.71 (2), p.197-202
Main Authors: Vilotijević Miroljub, Grahovac Nebojša N., Milovanović Ljiljana M., Marinković Slobodan N.
Format: Article
Language:English
Subjects:
diamond cvd
low pressure flat flame
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Summary:Diamond coatings were deposited onto Mo and WC-Co substrates using a low pressure premixed acetylene-oxygen flat flame by means of a special apparatus operating at 50 mbar. Uniform diamond coatings containing significant amounts of non-diamond carbon were deposited over areas of »7 cm2 onto Mo substrates, the coating thickness after 1 h deposition amounted to »1 µm. Upon machining an Al-12 % Si alloy under identical conditions, the diamond coated WC-Co cutting tool inserts showed 30 % less wear than the as-received inserts.
ISSN:0352-5139
1820-7421
DOI:10.2298/JSC0602197V