Chemical vapour deposition of diamond using low pressure flat combustion flame

Diamond coatings were deposited onto Mo and WC-Co substrates using a low pressure premixed acetylene-oxygen flat flame by means of a special apparatus operating at 50 mbar. Uniform diamond coatings containing significant amounts of non-diamond carbon were deposited over areas of »7 cm2 onto Mo subst...

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Published in:Journal of the Serbian Chemical Society 2006-01, Vol.71 (2), p.197-202
Main Authors: Vilotijević Miroljub, Grahovac Nebojša N., Milovanović Ljiljana M., Marinković Slobodan N.
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Language:English
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diamond cvd
low pressure flat flame
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container_issue 2
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container_title Journal of the Serbian Chemical Society
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creator Vilotijević Miroljub
Grahovac Nebojša N.
Milovanović Ljiljana M.
Marinković Slobodan N.
description Diamond coatings were deposited onto Mo and WC-Co substrates using a low pressure premixed acetylene-oxygen flat flame by means of a special apparatus operating at 50 mbar. Uniform diamond coatings containing significant amounts of non-diamond carbon were deposited over areas of »7 cm2 onto Mo substrates, the coating thickness after 1 h deposition amounted to »1 µm. Upon machining an Al-12 % Si alloy under identical conditions, the diamond coated WC-Co cutting tool inserts showed 30 % less wear than the as-received inserts.
doi_str_mv 10.2298/JSC0602197V
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subjects diamond cvd
low pressure flat flame
title Chemical vapour deposition of diamond using low pressure flat combustion flame
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