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Oxidation behavior of graphene-coated copper at intrinsic graphene defects of different origins

The development of ultrathin barrier films is vital to the advanced semiconductor industry. Graphene appears to hold promise as a protective coating; however, the polycrystalline and defective nature of engineered graphene hinders its practical applications. Here, we investigate the oxidation behavi...

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Bibliographic Details
Published in:Nature communications 2017-11, Vol.8 (1), p.1549-12, Article 1549
Main Authors: Kwak, Jinsung, Jo, Yongsu, Park, Soon-Dong, Kim, Na Yeon, Kim, Se-Yang, Shin, Hyung-Joon, Lee, Zonghoon, Kim, Sung Youb, Kwon, Soon-Yong
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Language:English
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Summary:The development of ultrathin barrier films is vital to the advanced semiconductor industry. Graphene appears to hold promise as a protective coating; however, the polycrystalline and defective nature of engineered graphene hinders its practical applications. Here, we investigate the oxidation behavior of graphene-coated Cu foils at intrinsic graphene defects of different origins. Macro-scale information regarding the spatial distribution and oxidation resistance of various graphene defects is readily obtained using optical and electron microscopies after the hot-plate annealing. The controlled oxidation experiments reveal that the degree of structural deficiency is strongly dependent on the origins of the structural defects, the crystallographic orientations of the underlying Cu grains, the growth conditions of graphene, and the kinetics of the graphene growth. The obtained experimental and theoretical results show that oxygen radicals, decomposed from water molecules in ambient air, are effectively inverted at Stone–Wales defects into the graphene/Cu interface with the assistance of facilitators. Graphene holds promise as a protective coating; however, lattice defects may hinder its practical applicability. Here, the authors investigate the oxidation behavior of graphene-coated copper foils and unveil the interplay between structural defects and oxygen radicals from water molecules in ambient air.
ISSN:2041-1723
2041-1723
DOI:10.1038/s41467-017-01814-8