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DEVELOPMENT AND FABRICATION OF A 5 KMC ELECTROCHEMICAL SWITCHING TRANSISTOR
The report describes the theoretical and experimental investigations which were performed to fabricate a germanium transistor exhibiting an f sub t of 5 Kmc/sec. Standard electrochemical methods with some necessary modifications were employed to fabricate the transistors. The intrinsic f sub t of th...
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creator | Schmechel, Donald M |
description | The report describes the theoretical and experimental investigations which were performed to fabricate a germanium transistor exhibiting an f sub t of 5 Kmc/sec. Standard electrochemical methods with some necessary modifications were employed to fabricate the transistors. The intrinsic f sub t of the fabricated transistor was determined to be 5 Kmc or greater but, due to an electrical interaction between the passive elements in the transistor and the TO-18 enclosure, useful measurement of this quantity could not be made. Recommendations are made for future work involving investigation of the influence of f sub t on switching speeds, more accurate definition of relationship between measured f sub t and device parameters, development of advanced transistor structures, and design and construction of a suitable enclosure for high speed devices.
Subcontract to Lincoln Lab., Mass. Inst. of Tech. |
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Subcontract to Lincoln Lab., Mass. Inst. of Tech.</description><language>eng</language><subject>CONSTRUCTION ; CONTAINERS ; CRYSTAL GROWTH ; Electrical and Electronic Equipment ; ELECTROCHEMISTRY ; ELECTRONIC SWITCHES ; ETCHED CRYSTALS ; GERMANIUM ; SEMICONDUCTOR DEVICES ; TRANSISTORS</subject><creationdate>1962</creationdate><rights>Approved for public release; distribution is unlimited.</rights><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>230,780,885,27567,27568</link.rule.ids><linktorsrc>$$Uhttps://apps.dtic.mil/sti/citations/AD0601915$$EView_record_in_DTIC$$FView_record_in_$$GDTIC$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Schmechel, Donald M</creatorcontrib><creatorcontrib>PHILCO CORP LANSDALE PA</creatorcontrib><title>DEVELOPMENT AND FABRICATION OF A 5 KMC ELECTROCHEMICAL SWITCHING TRANSISTOR</title><description>The report describes the theoretical and experimental investigations which were performed to fabricate a germanium transistor exhibiting an f sub t of 5 Kmc/sec. Standard electrochemical methods with some necessary modifications were employed to fabricate the transistors. The intrinsic f sub t of the fabricated transistor was determined to be 5 Kmc or greater but, due to an electrical interaction between the passive elements in the transistor and the TO-18 enclosure, useful measurement of this quantity could not be made. Recommendations are made for future work involving investigation of the influence of f sub t on switching speeds, more accurate definition of relationship between measured f sub t and device parameters, development of advanced transistor structures, and design and construction of a suitable enclosure for high speed devices.
Subcontract to Lincoln Lab., Mass. Inst. of Tech.</description><subject>CONSTRUCTION</subject><subject>CONTAINERS</subject><subject>CRYSTAL GROWTH</subject><subject>Electrical and Electronic Equipment</subject><subject>ELECTROCHEMISTRY</subject><subject>ELECTRONIC SWITCHES</subject><subject>ETCHED CRYSTALS</subject><subject>GERMANIUM</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>TRANSISTORS</subject><fulltext>true</fulltext><rsrctype>report</rsrctype><creationdate>1962</creationdate><recordtype>report</recordtype><sourceid>1RU</sourceid><recordid>eNrjZPB2cQ1z9fEP8HX1C1Fw9HNRcHN0CvJ0dgzx9PdT8HdTcFQwVfD2dVZw9XF1Dgnyd_Zw9QXK-igEh3uGOHt4-rkrhAQ5-gV7Bof4B_EwsKYl5hSn8kJpbgYZN1egKt2Ukszk-OKSzLzUknhHFwMzA0NLQ1NjAtIApc0qgw</recordid><startdate>19620414</startdate><enddate>19620414</enddate><creator>Schmechel, Donald M</creator><scope>1RU</scope><scope>BHM</scope></search><sort><creationdate>19620414</creationdate><title>DEVELOPMENT AND FABRICATION OF A 5 KMC ELECTROCHEMICAL SWITCHING TRANSISTOR</title><author>Schmechel, Donald M</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-dtic_stinet_AD06019153</frbrgroupid><rsrctype>reports</rsrctype><prefilter>reports</prefilter><language>eng</language><creationdate>1962</creationdate><topic>CONSTRUCTION</topic><topic>CONTAINERS</topic><topic>CRYSTAL GROWTH</topic><topic>Electrical and Electronic Equipment</topic><topic>ELECTROCHEMISTRY</topic><topic>ELECTRONIC SWITCHES</topic><topic>ETCHED CRYSTALS</topic><topic>GERMANIUM</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>TRANSISTORS</topic><toplevel>online_resources</toplevel><creatorcontrib>Schmechel, Donald M</creatorcontrib><creatorcontrib>PHILCO CORP LANSDALE PA</creatorcontrib><collection>DTIC Technical Reports</collection><collection>DTIC STINET</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Schmechel, Donald M</au><aucorp>PHILCO CORP LANSDALE PA</aucorp><format>book</format><genre>unknown</genre><ristype>RPRT</ristype><btitle>DEVELOPMENT AND FABRICATION OF A 5 KMC ELECTROCHEMICAL SWITCHING TRANSISTOR</btitle><date>1962-04-14</date><risdate>1962</risdate><abstract>The report describes the theoretical and experimental investigations which were performed to fabricate a germanium transistor exhibiting an f sub t of 5 Kmc/sec. Standard electrochemical methods with some necessary modifications were employed to fabricate the transistors. The intrinsic f sub t of the fabricated transistor was determined to be 5 Kmc or greater but, due to an electrical interaction between the passive elements in the transistor and the TO-18 enclosure, useful measurement of this quantity could not be made. Recommendations are made for future work involving investigation of the influence of f sub t on switching speeds, more accurate definition of relationship between measured f sub t and device parameters, development of advanced transistor structures, and design and construction of a suitable enclosure for high speed devices.
Subcontract to Lincoln Lab., Mass. Inst. of Tech.</abstract><oa>free_for_read</oa></addata></record> |
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source | DTIC Technical Reports |
subjects | CONSTRUCTION CONTAINERS CRYSTAL GROWTH Electrical and Electronic Equipment ELECTROCHEMISTRY ELECTRONIC SWITCHES ETCHED CRYSTALS GERMANIUM SEMICONDUCTOR DEVICES TRANSISTORS |
title | DEVELOPMENT AND FABRICATION OF A 5 KMC ELECTROCHEMICAL SWITCHING TRANSISTOR |
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