SOME PROPERTY CHANGE IN PYROLITIC SiO2 FILMS AFTER THERMAL TREATMENT

Changes in the etch rate, refractive index, and infrared absorption spectra for pyrolitic SiO2 films, along with variations in the volt-ampere characteristics for Ag-SiO2-Ge structures, after thermal treatment in various gas media have been studied. It has been established that thermal treatment of...

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Bibliographic Details
Main Authors: Kalnynya,R. P, Feltyn,I. A, Freiberg,L. A, Eglitis,I. E
Format: Report
Language:English
Subjects:
Atomic and Molecular Physics and Spectroscopy
CHEMICALS
Coatings, Colorants and Finishes
DEPOSITION
INFRARED SPECTRA
PYROLYSIS
SILANES
SILICON DIOXIDE
TRANSLATIONS
USSR
VAPOR DEPOSITION
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Summary:Changes in the etch rate, refractive index, and infrared absorption spectra for pyrolitic SiO2 films, along with variations in the volt-ampere characteristics for Ag-SiO2-Ge structures, after thermal treatment in various gas media have been studied. It has been established that thermal treatment of pyrolitic SiO2 films has the effect of stabilizing all the properties considered. The treatment of films in water vapor at temperatures above 70 degrees centigrade has proven to be the most effective. It has been found that the properties which depend on the etch rate of the films become stable in a shorter time than the volt-ampere characteristics. Thermal treatment exercises a substantial effect particularly on films grown in an oxygen medium at low temperatures. (Author) Edited trans. of Akademiya Nauk Latviiskoi SSR, Riga. Izvestiya. Seriya Fizicheskikh i Tekhnicheskikh Nauk, n3 p13-18 1968.