Fabrication and Evaluation of RF Sputtered Barium Titanate Thin Films

Structural, chemical, dielectric, and ferroelectric (limited) characteristics of RF sputtered barium titanate (BaTiO3) are described. Primary interest was to determine film capability for providing high capacitance devices for hybrid and thin film integrated circuits. The extent of ferroelectric fil...

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Bibliographic Details
Main Authors: Pratt,I. H, Firestone,S, Frankel,H. C
Format: Report
Language:English
Subjects:
BARIUM COMPOUNDS
BARIUM TITANATES
DIELECTRIC FILMS
Electrical and Electronic Equipment
FERROELECTRIC MATERIALS
FIXED CAPACITORS
HYBRID CIRCUITS
INTEGRATED CIRCUITS
MICROMINIATURIZATION
SPUTTERING
THIN FILM CAPACITORS
THIN FILMS
TITANATES
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Summary:Structural, chemical, dielectric, and ferroelectric (limited) characteristics of RF sputtered barium titanate (BaTiO3) are described. Primary interest was to determine film capability for providing high capacitance devices for hybrid and thin film integrated circuits. The extent of ferroelectric film behavior was also of concern for charge storage use in the development of thin film image plates for miniature solid state facsimile cameras. Metal-dielectric-metal capacitor structures incorporating amorphous or polycrystalline BaTiO3 films were fabricated and evaluated. (Author)