Electrochemical Atomic Layer Processing

Atomic layer processing with electrochemical control is discussed. A method for the electrodeposition of compound semiconductors based on the principles of atomic layer epitaxy (ALE) is reported, with specific reference to the formation of ZnTe. This method is referred to as electrochemical atomic l...

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Bibliographic Details
Main Authors: Rhee, Choong K, Huang, Baoming M, Wilmer, Elvin M, Thomas, Sajan, Stickney, John L
Format: Report
Language:English
Subjects:
AFM
Atomic and Molecular Physics and Spectroscopy
ATOMIC FORCE
ATOMIC STRUCTURE
ATOMS
CADMIUM SELENIDES
CADMIUM TELLURIDES
CELLS
COMPUTERS
CONTROL
CYCLES
DEPOSITION
DIGITAL SYSTEMS
ECALE(ELECTROCHEMICAL ATOMIC LAYER EPITAXY)
Electrical and Electronic Equipment
ELECTROCHEMISTRY
ELECTRODEPOSITION
EPITAXIAL GROWTH
ETCHING
FLOW
GALLIUM ARSENIDES
Inorganic Chemistry
LAYERS
LEAD(METAL)
MERCURY
METHODOLOGY
MICROSCOPY
OXIDATION
Physical Chemistry
PROCESSING
SCANNING
SEMICONDUCTORS
SUBSTRATES
SULFIDES
SURFACE ANALYSIS
THICKNESS
THIN FILMS
THINNESS
TUNNELING
UPD(UNDERPOTENTIAL DEPOSITION)
ZINC TELLURIDES
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Description
Summary:Atomic layer processing with electrochemical control is discussed. A method for the electrodeposition of compound semiconductors based on the principles of atomic layer epitaxy (ALE) is reported, with specific reference to the formation of ZnTe. This method is referred to as electrochemical atomic layer epitaxy (ECALE). A number of II-VI compounds have been formed using this method, including: CdTe, CdSe, CdS, ZnTe, ZnSe, ZnS and HgSe. Initial studies of GaAs and PbSe have also been pursued. A computer-controlled electrochemical flow deposition system is described. The system has been constructed to form thin- films of the compounds listed above using the ECALE methodology. In addition, an analogous digital electrochemical etching procedure has been developed, and used to etch CdTe substrates. The etching cycle consists of oxidizing off the top atomic layer of Cd atoms at a relatively positive potential, followed by Microscopy (AFM) has been used to image the resulting features. ECALE and the digital electrochemical etching process are both based on selecting potentials where an atomic layer of an element is deposited, or removed, in a surface limited reaction. The potentials used are referred to as underpotentials in the electrochemical literature. The atomic layer deposition process is referred to as underpotential deposition (UPD). ECALE, CdTe, Digital etching, Surfaces analysis, Flow cell, Electrochemistry.