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Ferroelectric Thin Films IX. Volume 655. Symposium Held in Boston, MA on November 26-30, 2000

This symposium, Ferroelectric Thin Films IX,' held November 26-30 at the 2000 MRS Fall Meeting in Boston, Massachusetts, was the ninth in a series of highly successful MRS symposia on this topic. Understanding ferroelectric thin films through use of novel and sophisticated characterization meth...

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Bibliographic Details
Main Authors: McIntyre, Paul C, Gilbert, Stephen R, Miyasaka, Yoichi, Schwartz, Robert W, Wouters, Dirk
Format: Report
Language:English
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Summary:This symposium, Ferroelectric Thin Films IX,' held November 26-30 at the 2000 MRS Fall Meeting in Boston, Massachusetts, was the ninth in a series of highly successful MRS symposia on this topic. Understanding ferroelectric thin films through use of novel and sophisticated characterization methods was an important theme in this edition of the symposium series. Both oral and poster presentations at the symposium described recent advances in scanning probe imaging methods and analysis techniques, electrical characterization methods, and x-ray and TEM-based probes of ferroelectric thin films. In addition, several presentations reviewed progress in the technology of ferroelectric thin films for use in semiconductor memories, piezoelectric devices, and other applications. The technical quality of the contributed presentations was evidenced by the awarding of Poster Awards by the 2000 Fall Meeting chairs to two posters in this symposium, a rare honor. Prepared in collaboration with Stanford Univ. Stanford, CA; Agilent Labs., Palo Alto, CA; NEC Corp. Sagamihara, Japan; Clemson Univ. SC; IMEC Leuven, Belgium. Pub. in Materials Research Society Symposium Proceedings Vol. 655.